基本信息:
- 专利标题: 一种铁电存储器及存储设备
- 专利标题(英):FERROELECTRIC MEMORY AND STORAGE DEVICE
- 申请号:PCT/CN2020/097809 申请日:2020-06-23
- 公开(公告)号:WO2021258305A1 公开(公告)日:2021-12-30
- 发明人: 许俊豪 , 卜思童 , 侯朝昭 , 张瑜 , 张燕燕
- 申请人: 华为技术有限公司
- 申请人地址: 中国广东省深圳市龙岗区坂田华为总部办公楼, Guangdong 518129
- 专利权人: 华为技术有限公司
- 当前专利权人: 华为技术有限公司
- 当前专利权人地址: 中国广东省深圳市龙岗区坂田华为总部办公楼, Guangdong 518129
- 代理机构: 北京中博世达专利商标代理有限公司
- 主分类号: G11C11/22
- IPC分类号: G11C11/22 ; H01L27/11502
A ferroelectric memory. The ferroelectric memory comprises at least one storage unit, and each storage unit comprises a first electrode (1), a second electrode (2), a third electrode (3), a ferroelectric layer (4), and a first semiconductor layer (10), second semiconductor layer (20), and third semiconductor layer (30) that are stacked; a PN junction is formed between the first semiconductor layer (10) and the second semiconductor layer (20); the first electrode (1) is disposed on a side of the first semiconductor layer (10) away from the second semiconductor layer (20); the third electrode (3) is disposed on a side of the third semiconductor layer (30) away from the second semiconductor layer (20); the ferroelectric layer (4) surrounds the entire side surface or a part of the side surface of the third semiconductor layer (30); and the second electrode (2) surrounds the ferroelectric layer (4). As such, subsequently, when data is read from and written into the storage unit(s), the impact that the polarization of the ferroelectric layer (4) has on the PN junction formed by the first semiconductor layer (10) and the second semiconductor layer (20) can be reduced, thereby improving the durability of the ferroelectric memory.
IPC结构图谱:
G11C11/56 | 组优先于G11C11/02至G11C11/54中各组。 |
--G11C11/19 | .在谐振电路中应用非线性电抗器件的 |
----G11C11/22 | ..应用铁电元件的 |