发明申请
WO2019169102A1 ELECTROSTATIC CHUCK WITH MULTIPLE RADIO FREQUENCY MESHES TO CONTROL PLASMA UNIFORMITY
审中-公开
基本信息:
- 专利标题： ELECTROSTATIC CHUCK WITH MULTIPLE RADIO FREQUENCY MESHES TO CONTROL PLASMA UNIFORMITY
- 申请号：PCT/US2019/020001 申请日：2019-02-28
- 公开(公告)号：WO2019169102A1 公开(公告)日：2019-09-06
- 发明人： HAMMOND, IV, Edward P. , BAEK, Jonghoon
- 申请人： APPLIED MATERIALS, INC.
- 申请人地址： 3050 Bowers Avenue Santa Clara, California 95054 US
- 专利权人： APPLIED MATERIALS, INC.
- 当前专利权人： APPLIED MATERIALS, INC.
- 当前专利权人地址： 3050 Bowers Avenue Santa Clara, California 95054 US
- 代理机构： PATTERSON, B. Todd et al.
- 优先权： US62/636,437 20180228
- 主分类号： H01L21/683
- IPC分类号： H01L21/683 ; H02N13/00 ; B23Q3/15 ; H05H1/46 ; H01J37/32 ; H01L21/67 ; H01L21/02
摘要：
The present disclosure relates to a method and apparatus for controlling a plasma sheath near a substrate edge. Changing the voltage/current distribution across the inner electrode and the outer electrode with in the substrate assembly facilitates the spatial distribution of the plasma across the substrate. The method includes providing a first radio frequency power to a central electrode embedded in a substrate support assembly, providing a second radio frequency power to an annular electrode embedded in the substrate support assembly at a location different than the central electrode, wherein the annular electrode circumferentially surrounds the central electrode, monitoring parameters of the first and second radio frequency power, and adjusting one or both of the first and second radio frequency power based on the monitored parameters.