基本信息:
- 专利标题： HETEROCYCLIC COMPOUNDS
- 申请号：PCT/IB2017/057870 申请日：2017-12-13
- 公开(公告)号：WO2018116072A1 公开(公告)日：2018-06-28
- 发明人： SAXENA, Rohit , PANMAND, Deepak Shankar , JENA, Lalit Kumar , SRIVASTAVA, Khushboo , RAJU, Jella Rama , MANJUNATHA, Sulur G , SAMANTA, Jatin , GARG, Ruchi , AUTKAR, Santosh Shridhar , VENKATESHA, Hagalavadi M , GADAKH, Ramdas Balu , KLAUSENER, Alexander G. M. , POSCHARNY, Konstantin
- 申请人： PI INDUSTRIES LTD.
- 申请人地址： 5th Floor, Vipul Square, B - Block, Sushant Lok, Phase -1 Gurgaon 122009 IN
- 专利权人： PI INDUSTRIES LTD.
- 当前专利权人： PI INDUSTRIES LTD.
- 当前专利权人地址： 5th Floor, Vipul Square, B - Block, Sushant Lok, Phase -1 Gurgaon 122009 IN
- 代理机构： GARG, Vidisha et al.
- 优先权： IN201611043525 20161220
- 主分类号： C07D217/02
- IPC分类号： C07D217/02 ; C07D217/22 ; C07D401/04 ; C07D405/04 ; C07D409/04 ; C07D413/04 ; C07D471/04 ; C07D491/048 ; C07D495/04 ; C07D498/04 ; C07D513/04 ; C07D519/04
摘要：
The present invention relates to compounds of the general formula (1) wherein the variables are defined as given in the description and claims. The invention further relates to uses of and to, processes and intermediates related to compounds of the general formula (I), wherein Q is wherein the substituents of I, Ia and Ib are as defined in description and claims.
IPC结构图谱:
| C | 化学；冶金 |
| --C07 | 有机化学 |
| ----C07D | 杂环化合物 |
| ------C07D217/00 | 杂环化合物，含异喹啉或氢化异喹啉环系 |
| --------C07D217/02 | .只有氢原子或仅含碳或氢原子的基直接连在含氮环的碳原子上：烷撑-双-异喹啉 |