发明申请
WO2017053812A1 METHOD AND SYSTEM FOR FOCUS ADJUSTMENT A MULTI-BEAM SCANNING ELECTRON MICROSCOPY SYSTEM
审中-公开
基本信息:
- 专利标题： METHOD AND SYSTEM FOR FOCUS ADJUSTMENT A MULTI-BEAM SCANNING ELECTRON MICROSCOPY SYSTEM
- 专利标题（中）：聚焦扫描电子显微系统聚焦调整方法与系统
- 申请号：PCT/US2016/053466 申请日：2016-09-23
- 公开(公告)号：WO2017053812A1 公开(公告)日：2017-03-30
- 发明人： MCCORD, Mark A. , KNIPPELMEYER, Rainer , MASNAGHETTI, Douglas , SIMMONS, Richard R. , YOUNG, Scott A
- 申请人： KLA-TENCOR CORPORATION
- 申请人地址： Legal Department One Technology Drive Milpitas, California 95035 US
- 专利权人： KLA-TENCOR CORPORATION
- 当前专利权人： KLA-TENCOR CORPORATION
- 当前专利权人地址： Legal Department One Technology Drive Milpitas, California 95035 US
- 代理机构： MCANDREWS, Kevin et al.
- 优先权： US62/222,325 20150923; US15/272,194 20160921
- 主分类号： G02B21/20
- IPC分类号： G02B21/20 ; H01J37/317
摘要：
A scanning electron microscopy system is disclosed. The system includes a multi-beam scanning electron microscopy (SEM) sub-system. The SEM sub-system includes a multi-beam electron source configured to form a plurality of electron beams, a sample stage configured to secure a sample, an electron-optical assembly to direct the electron beams onto a portion of the sample, and a detector assembly configured to simultaneously acquire multiple images of the surface of the sample. The system includes a controller configured to receive the images from the detector assembly, identify a best focus image of images by analyzing one or more image quality parameters of the images, and direct the multi-lens array to adjust a focus of one or more electron beams based on a focus of an electron beam corresponding with the identified best focus image.
摘要（中）：
公开了一种扫描电子显微镜系统。 该系统包括多光束扫描电子显微镜（SEM）子系统。 SEM子系统包括被配置为形成多个电子束的多光束电子源，被配置为固定样本的样品台，将电子束引导到样品的一部分上的电子 - 光学组件，以及检测器 组件被配置为同时获取样品表面的多个图像。 该系统包括被配置为从检测器组件接收图像的控制器，通过分析图像的一个或多个图像质量参数来识别图像的最佳聚焦图像，并且引导多透镜阵列调整一个或多个电子的焦点 基于与所识别的最佳聚焦图像相对应的电子束的焦点的光束。