基本信息:
- 专利标题： SYSTEM AND METHOD FOR BI-FACIAL PROCESSING OF SUBSTRATES
- 专利标题（中）：基板双面加工的系统和方法
- 申请号：PCT/US2015/016799 申请日：2015-02-20
- 公开(公告)号：WO2015127191A1 公开(公告)日：2015-08-27
- 发明人： BLUCK, Terry , SHAH, Vinay , LATCHFORD, Ian , RIPOSAN, Alexandru
- 申请人： INTEVAC, INC. , BLUCK, Terry , SHAH, Vinay , LATCHFORD, Ian , RIPOSAN, Alexandru
- 申请人地址： 3560 Bassett Street Santa Clara, CA 95054 US
- 专利权人： INTEVAC, INC.,BLUCK, Terry,SHAH, Vinay,LATCHFORD, Ian,RIPOSAN, Alexandru
- 当前专利权人： INTEVAC, INC.,BLUCK, Terry,SHAH, Vinay,LATCHFORD, Ian,RIPOSAN, Alexandru
- 当前专利权人地址： 3560 Bassett Street Santa Clara, CA 95054 US
- 代理机构： BACH, Joseph
- 优先权： US61/942,594 20140220; US61/943,999 20140224
- 主分类号： C23C14/50
- IPC分类号： C23C14/50 ; H01L21/677
摘要：
A system for processing substrates in plasma chambers, such that all substrates transport and loading/unloading operations are performed in atmospheric environment, but processing is performed in vacuum environment. The substrates are transported throughout the system on carriers. The system's chambers are arranged linearly, such that carriers move from one chamber directly to the next. A conveyor, placed above or below the system's chambers, returns the carriers to the system's entry area after processing is completed. The carriers are configured for supporting substrates of different sizes. The carriers are also configured for flipping the substrates such that both surfaces of the substrates may be processed.
摘要（中）：
用于处理等离子体室中的衬底的系统，使得在大气环境中执行所有衬底的输送和加载/卸载操作，但是在真空环境中进行处理。 基板在载体上通过系统传送。 系统的室线性布置，使得载体从一个室直接移动到下一个室。 放置在系统腔室上方或下方的输送机在处理完成后将运输工具返回系统的进入区域。 载体构造成用于支撑不同尺寸的基底。 载体也构造成用于翻转基板，使得可以处理基板的两个表面。