基本信息:
- 专利标题： OPTICAL ASSEMBLY WITH SUPPRESSION OF DEGRADATION
- 专利标题（中）：光学组件抑制降解
- 申请号：PCT/EP2012/063101 申请日：2012-07-05
- 公开(公告)号：WO2013010806A1 公开(公告)日：2013-01-24
- 发明人： SCHMIDT, Stefan-Wolfgang , EHM, Dirk Heinrich , WALTER, Markus
- 申请人： CARL ZEISS SMT GMBH , SCHMIDT, Stefan-Wolfgang , EHM, Dirk Heinrich , WALTER, Markus
- 申请人地址： Rudolf-Eber-Strasse 2 73447 Oberkochen DE
- 专利权人： CARL ZEISS SMT GMBH,SCHMIDT, Stefan-Wolfgang,EHM, Dirk Heinrich,WALTER, Markus
- 当前专利权人： CARL ZEISS SMT GMBH,SCHMIDT, Stefan-Wolfgang,EHM, Dirk Heinrich,WALTER, Markus
- 当前专利权人地址： Rudolf-Eber-Strasse 2 73447 Oberkochen DE
- 代理机构： KOHLER SCHMID MÖBUS PATENTANWÄLTE
- 优先权： DE10 20110720; US61/509,733 20110720
- 主分类号： G03F7/20
- IPC分类号： G03F7/20 ; G21K1/06
摘要：
The invention relates to an optical assembly, in particular a projection exposure apparatus for EUV lithography, comprising: a beam generating system for generating radiation (6) at an operating wavelength,at least one optical element (13, 14) which is subjected to the radiation (6) and is arranged in a residual gas atmosphere, and a feed device for feeding at least one gaseous constituent into the residual gas atmosphere in order to suppress a degradation of the surface (14a) of the optical element (14) that is induced by the radiation, wherein either a beam diameter (d) of the radiation (6) at the surface of the optical element, in particular at the surfaces of all optical elements of the optical assembly, lies above a threshold value (d c ) so that a suppression of the degradation by the gaseous constituent is effective, or the beam diameter (d) at the surface (14a) of the optical element (14) lies below the threshold value (d c ) so that a reduction of the effectiveness of the suppression of degradation occurs,and at least one further device (25, 27) for the improved suppression of the degradation of the surface (14a) is assigned to the optical element (14).The invention also relates to an associated method for operating an optical assembly.
摘要（中）：
本发明涉及一种光学组件，特别是用于EUV光刻的投影曝光设备，包括：用于产生工作波长的辐射（6）的光束产生系统，至少一个光学元件（13,14） 辐射（6）并且设置在残留气体气氛中，以及用于将至少一种气态成分供给到残留气体气氛中的进料装置，以便抑制光学元件（14）的表面（14a）的劣化， 其特征在于光学组件的所有光学元件的表面处的辐射（6）的光束直径（d）在光学元件的表面处，特别是在阈值（dc）之上，所以光束直径（d） 抑制气态组分的降解是有效的，或者光学元件（14）的表面（14a）处的光束直径（d）低于阈值（dc），使得降低 suppres 并且至少一个用于改善对表面（14a）的降解的抑制的装置（25,27）被分配给光学元件（14）。本发明还涉及一种用于操作 光学组件。