基本信息:
- 专利标题： LITHOGRAPHIC APPARATUS AND SPECTRAL PURITY FILTER
- 专利标题（中）：光刻设备和光谱滤光片
- 申请号：PCT/EP2011/051546 申请日：2011-02-03
- 公开(公告)号：WO2011117009A1 公开(公告)日：2011-09-29
- 发明人： MEDVEDEV, Viacheslav , BANINE, Vadim , KRIVTSUN, Vladimir , SOER, Wouter , YAKUNIN, Andrei
- 申请人： ASML NETHERLANDS B.V. , MEDVEDEV, Viacheslav , BANINE, Vadim , KRIVTSUN, Vladimir , SOER, Wouter , YAKUNIN, Andrei
- 申请人地址： De Run 6501 NL-5504 DR Veldhoven NL
- 专利权人： ASML NETHERLANDS B.V.,MEDVEDEV, Viacheslav,BANINE, Vadim,KRIVTSUN, Vladimir,SOER, Wouter,YAKUNIN, Andrei
- 当前专利权人： ASML NETHERLANDS B.V.,MEDVEDEV, Viacheslav,BANINE, Vadim,KRIVTSUN, Vladimir,SOER, Wouter,YAKUNIN, Andrei
- 当前专利权人地址： De Run 6501 NL-5504 DR Veldhoven NL
- 优先权： US61/364,725 20100715; US61/330,721 20100503; US61/317,167 20100324
- 主分类号： G03F7/20
- IPC分类号： G03F7/20 ; G21K1/06
摘要：
A reflector includes a multi layer mirror structure configured to reflect radiation at a first wavelength, and one or more additional layers. The absorbance and refractive index at a second wavelength of the multi layer mirror structure and the one or more additional layers, and the thickness of the multi layer mirror structure and the one or more additional layers, are configured such that radiation of the second wavelength which is reflected from a surface of the reflector interferes in a destructive manner with radiation of the second wavelength which is reflected from within the reflector.
摘要（中）：
反射器包括被配置为反射第一波长的辐射和一个或多个附加层的多层反射镜结构。 在多层反射镜结构和一个或多个附加层的第二波长处的吸光度和折射率以及多层反射镜结构和一个或多个附加层的厚度被配置为使得第二波长的辐射 从反射器的表面反射以破坏性方式干涉从反射器内反射的第二波长的辐射。