基本信息:
- 专利标题： DEBRIS PREVENTION SYSTEM AND LITHOGRAPHIC APPARATUS
- 专利标题（中）：防破坏系统和平面设备
- 申请号：PCT/NL2008/050502 申请日：2008-07-22
- 公开(公告)号：WO2009014439A2 公开(公告)日：2009-01-29
- 发明人： SOER, Wouter Anthon , VAN HERPEN, Maarten Marinus Johannes Wilhelmus
- 申请人： ASML NETHERLANDS B.V. , SOER, Wouter Anthon , VAN HERPEN, Maarten Marinus Johannes Wilhelmus
- 申请人地址： De Run 6501 NL-5504 DR Veldhoven NL
- 专利权人： ASML NETHERLANDS B.V.,SOER, Wouter Anthon,VAN HERPEN, Maarten Marinus Johannes Wilhelmus
- 当前专利权人： ASML NETHERLANDS B.V.,SOER, Wouter Anthon,VAN HERPEN, Maarten Marinus Johannes Wilhelmus
- 当前专利权人地址： De Run 6501 NL-5504 DR Veldhoven NL
- 代理机构： HATZMANN, M.J.
- 优先权： US11/878,306 20070723
- 主分类号： G03F7/20
- IPC分类号： G03F7/20 ; B08B1/00
摘要：
A debris prevention system is constructed and arranged to prevent debris emanating from a radiation source from propagating with radiation from the radiation source into or within a lithographic apparatus. The debris prevention system includes a first foil trap that is rotatable around an axis of rotation, and a second foil trap that at least partly encloses the first foil trap. The second foil trap includes a plurality of foils optically open respective to a central location for placement of a radiation source and optically closed respective to directions perpendicular to the axis of rotation.
摘要（中）：
构建和布置防碎片系统，以防止从辐射源发出的碎屑从辐射源的辐射传播到光刻设备内或其内。 碎片防止系统包括可围绕旋转轴线旋转的第一箔捕获器和至少部分地包围第一箔捕获器的第二箔阱。 第二箔捕获器包括多个箔片，其相应于中心位置光学地打开，用于放置辐射源并且相应于垂直于旋转轴线的方向光学地闭合。