基本信息:
- 专利标题： Anodized showerhead
- 申请号：US12779167 申请日：2010-05-13
- 公开(公告)号：US09758869B2 公开(公告)日：2017-09-12
- 发明人： Soo Young Choi , Suhail Anwar , Gaku Furuta , Beom Soo Park , Robin L Tiner , John M White , Shinichi Kurita
- 申请人： Soo Young Choi , Suhail Anwar , Gaku Furuta , Beom Soo Park , Robin L Tiner , John M White , Shinichi Kurita
- 申请人地址： US CA Santa Clara
- 专利权人： Applied Materials, Inc.
- 当前专利权人： Applied Materials, Inc.
- 当前专利权人地址： US CA Santa Clara
- 代理机构： Patterson + Sheridan LLP
- 主分类号： C23C16/00
- IPC分类号： C23C16/00 ; H01J37/00 ; C23C16/455 ; C23C16/44 ; C23C16/509 ; H01J37/32
摘要：
Embodiments disclosed herein generally relate to an apparatus having an anodized gas distribution showerhead. In large area, parallel plate RF processing chambers, mastering the RF return path can be challenging. Arcing is a frequent problem encountered in RF processing chambers. To reduce arcing in RF processing chambers, straps may be coupled to the susceptor to shorten the RF return path, a ceramic or insulating or anodized shadow frame may be coupled to the susceptor during processing, and an anodized coating may be deposited onto the edge of the showerhead that is nearest the chamber walls. The anodized coating may reduce arcing between the showerhead and the chamber walls and therefore enhance film properties and increase deposition rate.
公开/授权文献:
- US20100288197A1 ANODIZED SHOWERHEAD 公开/授权日：2010-11-18