基本信息:
- 专利标题： POLISHING PADS PRODUCED BY AN ADDITIVE MANUFACTURING PROCESS
- 申请号：US17114633 申请日：2020-12-08
- 公开(公告)号：US20210107116A1 公开(公告)日：2021-04-15
- 发明人： Rajeev BAJAJ , Daniel REDFIELD , Mahendra C. ORILALL , Boyi FU , Aniruddh Jagdish KHANNA , Jason G. FUNG , Ashwin CHOCKALINGAM , Mayu YAMAMURA , Veera Raghava Reddy KAKIREDDY , Gregory E. MENK , Nag B. PATIBANDLA
- 申请人： Applied Materials, Inc.
- 申请人地址： US CA Santa Clara
- 专利权人： Applied Materials, Inc.
- 当前专利权人： Applied Materials, Inc.
- 当前专利权人地址： US CA Santa Clara
- 主分类号： B24D11/00
- IPC分类号： B24D11/00 ; B24B37/22 ; B24B37/24 ; B24B37/26 ; B24D11/04 ; B24D3/28
摘要：
Embodiments of the present disclosure relate to advanced polishing pads with tunable chemical, material and structural properties, and new methods of manufacturing the same. According to one or more embodiments of the disclosure, it has been discovered that a polishing pad with improved properties may be produced by an additive manufacturing process, such as a three-dimensional (3D) printing process. Embodiments of the present disclosure thus may provide an advanced polishing pad that has discrete features and geometries, formed from at least two different materials that include functional polymers, functional oligomers, reactive diluents, and curing agents. For example, the advanced polishing pad may be formed from a plurality of polymeric layers, by the automated sequential deposition of at least one resin precursor composition followed by at least one curing step, wherein each layer may represent at least one polymer composition, and/or regions of different compositions.
公开/授权文献:
IPC结构图谱:
| B | 作业；运输 |
| --B24 | 磨削；抛光 |
| ----B24D | 磨削、抛光或刃磨用的工具 |
| ------B24D11/00 | 柔性磨料的结构特征；生产这类材料的特点 |