发明申请
US20200157089A1 HETEROARYL-SUBSTITUTED SULFONAMIDE COMPOUNDS AND THEIR USE AS THERAPEUTIC AGENTS
审中-公开
基本信息:
- 专利标题： HETEROARYL-SUBSTITUTED SULFONAMIDE COMPOUNDS AND THEIR USE AS THERAPEUTIC AGENTS
- 申请号：US16556055 申请日：2019-08-29
- 公开(公告)号：US20200157089A1 公开(公告)日：2020-05-21
- 发明人： Jean-Christophe Andrez , Kristen Nicole Burford , Christoph Martin Dehnhardt , Thilo Focken , Michael Edward Grimwood , Qi Jia , Verner Alexander Lofstrand , Shaoyi Sun , Steven Sigmund Wesolowski , Michael Scott Wilson , Alla Yurevna Zenova
- 申请人： Xenon Pharmaceuticals Inc.
- 主分类号： C07D417/14
- IPC分类号： C07D417/14 ; C07D417/12 ; C07D401/14 ; C07D401/12 ; C07D409/12 ; C07D487/08 ; C07D471/04 ; C07D413/12
摘要：
This invention is directed to benzenesulfonamide compounds, as stereoisomers, enantiomers, tautomers thereof or mixtures thereof; or pharmaceutically acceptable salts, solvates or prodrugs thereof, for the treatment of diseases or conditions associated with voltage-gated sodium channels, such as epilepsy and/or epileptic seizure disorders.
公开/授权文献:
IPC结构图谱:
| C | 化学；冶金 |
| --C07 | 有机化学 |
| ----C07D | 杂环化合物 |
| ------C07D417/00 | 杂环化合物，含两个或更多个杂环、至少有1个环有氮原子和硫原子作为仅有的杂环原子，C07D415/00组不包含的 |
| --------C07D417/14 | .含有3个或更多个杂环 |