
基本信息:
- 专利标题: SYSTEM AND METHOD FOR LASER BEVELING AND/OR POLISHING
- 申请号:US16422558 申请日:2019-05-24
- 公开(公告)号:US20190314934A1 公开(公告)日:2019-10-17
- 发明人: Jeffrey P. Sercel , Marco Mendes , Rouzbeh Sarrafi , Joshua Schoenly , Xiangyang Song , Mathew Hannon , Miroslaw Sokol
- 申请人: IPG Photonics Corporation
- 主分类号: B23K26/361
- IPC分类号: B23K26/361 ; B23K26/38 ; B23K26/402 ; B23K26/08
摘要:
Laser processing of hard dielectric materials may include cutting a part from a hard dielectric material using a continuous wave laser operating in a quasi-continuous wave (QCW) mode to emit consecutive laser light pulses in a wavelength range of about 1060 nm to 1070 nm. Cutting using a QCW laser may be performed with a lower duty cycle (e.g., between about 1% and 15%) and in an inert gas atmosphere such as nitrogen, argon or helium. Laser processing of hard dielectric materials may further include post-cut processing the cut edges of the part cut from the dielectric material, for example, by beveling and/or polishing the edges to reduce edge defects. The post-cut processing may be performed using a laser beam with different laser parameters than the beam used for cutting, for example, by using a shorter wavelength (e.g., 193 nm excimer laser) and/or a shorter pulse width (e.g., picosecond laser).
公开/授权文献:
- US11565350B2 System and method for laser beveling and/or polishing 公开/授权日:2023-01-31
IPC结构图谱:
B23K26/001 | .这个大组包括:激光加工用于制造削弱层,有或没有移除材料 |
--B23K26/352 | .用于表面处理的 |
----B23K26/361 | ..用于倒角或机械修边 |