
基本信息:
- 专利标题: Determining Information for Defects on Wafers
- 申请号:US16400644 申请日:2019-05-01
- 公开(公告)号:US20190257768A1 公开(公告)日:2019-08-22
- 发明人: Stefano Palomba , Pavel Kolchin , Mikhail Haurylau , Robert M. Danen , David W. Shortt
- 申请人: KLA-Tencor Corporation
- 主分类号: G01N21/95
- IPC分类号: G01N21/95 ; G01N21/94 ; G01N21/64
摘要:
Systems and methods for determining information for defects on a wafer are provided. One system includes an illumination subsystem configured to direct light having one or more illumination wavelengths to a wafer. The one or more illumination wavelengths are selected to cause fluorescence from one or more materials on the wafer without causing fluorescence from one or more other materials on the wafer. The system also includes a detection subsystem configured to detect only the fluorescence from the one or more materials or to detect non-fluorescent light from the wafer without detecting the fluorescence from the one or more materials. In addition, the system includes a computer subsystem configured to determine information for defects on the wafer using output generated by the detection subsystem responsive to the detected fluorescence or the detected non-fluorescent light.
公开/授权文献:
- US10571407B2 Determining information for defects on wafers 公开/授权日:2020-02-25
IPC结构图谱:
G | 物理 |
--G01 | 测量;测试 |
----G01N | 借助于测定材料的化学或物理性质来测试或分析材料 |
------G01N21/00 | 利用光学手段,即利用红外光、可见光或紫外光来测试或分析材料 |
--------G01N21/01 | .便于进行光学测试的装置或仪器 |
----------G01N21/88 | ..测试瑕疵、缺陷或污点的存在 |
------------G01N21/95 | ...特征在于待测物品的材料或形状 |