发明申请
US20160332869A1 BLOCK COPOLYMER NANOSTRUCTURES FORMED BY DISTURBED SELF-ASSEMBLY AND USES THEREOF
审中-公开
![BLOCK COPOLYMER NANOSTRUCTURES FORMED BY DISTURBED SELF-ASSEMBLY AND USES THEREOF](/abs-image/US/2016/11/17/US20160332869A1/abs.jpg.150x150.jpg)
基本信息:
- 专利标题: BLOCK COPOLYMER NANOSTRUCTURES FORMED BY DISTURBED SELF-ASSEMBLY AND USES THEREOF
- 专利标题(中):通过干扰自组装形成的嵌段共聚物纳米结构及其用途
- 申请号:US15107647 申请日:2014-12-18
- 公开(公告)号:US20160332869A1 公开(公告)日:2016-11-17
- 发明人: Yu WANG , Wei-hong ZHONG
- 申请人: WASHINGTON STATE UNIVERSITY
- 国际申请: PCT/US14/71140 WO 20141218
- 主分类号: B81C1/00
- IPC分类号: B81C1/00 ; C08F299/04 ; C08G81/00
摘要:
Block copolymer nanostructures such as nanosheets, nanoribbons, and nanotubes, are provided. The nanotructures are formed by the self-assembly of block copolymers during evaporation of solvent from a sol that has been “disturbed”, either i) by the introduction of relief (e.g. curvature) and/or the inclusion of nanoparticles in the sol; or ii) externally, e.g. by physical deformation of a semi-solid form of the sol, or a combination of internal and external disturbance. The nanostructures have uses in, for example, energy devices, electronics, sensors and drug delivery applications.
摘要(中):
提供了嵌段共聚物纳米结构如纳米片,纳米带和纳米管。 纳米结构通过嵌段共聚物的自组装形成,其中溶剂从已被“扰动”的溶胶中蒸发,或者i)通过引入浮雕(例如曲率)和/或将纳米颗粒纳入溶胶中; 或ii)外部,例如。 通过半固体形式的溶胶的物理变形,或内部和外部干扰的组合。 纳米结构在例如能量器件,电子学,传感器和药物递送应用中具有应用。
公开/授权文献:
IPC结构图谱:
B | 作业;运输 |
--B81 | 微观结构技术 |
----B81C | 专门适用于制造或处理微观结构的装置或系统的方法或设备 |
------B81C1/00 | 在基片内或其上制造或处理的装置或系统 |