发明申请
US20140352737A1 SUBSTRATE CLEANING APPARATUS, SUBSTRATE CLEANING METHOD AND NON-TRANSITORY STORAGE MEDIUM
有权
基本信息:
- 专利标题： SUBSTRATE CLEANING APPARATUS, SUBSTRATE CLEANING METHOD AND NON-TRANSITORY STORAGE MEDIUM
- 专利标题（中）：基板清洁装置，基板清洁方法和非存储存储介质
- 申请号：US14283331 申请日：2014-05-21
- 公开(公告)号：US20140352737A1 公开(公告)日：2014-12-04
- 发明人： Atsushi OOKOUCHI , Kousuke YOSHIHARA , Hiroshi ICHINOMIYA , Hirosi NISIHATA , Ryouichirou NAITOU
- 申请人： Tokyo Electron Limited
- 申请人地址： JP Tokyo
- 专利权人： Tokyo Electron Limited
- 当前专利权人： Tokyo Electron Limited
- 当前专利权人地址： JP Tokyo
- 优先权： JP2013-112395 20130528; JP2014-014864 20140129; JP2014-058221 20140320
- 主分类号： H01L21/67
- IPC分类号： H01L21/67
摘要：
A cleaning liquid and a gas are discharged in sequence to a central portion of a substrate while the substrate is being rotated, and after nozzles that discharge them are moved to a peripheral edge side of the substrate, discharge of the cleaning liquid is switched to a second cleaning liquid nozzle set at a position deviated from a movement locus of the first cleaning liquid nozzle. Both of the nozzles are moved toward the peripheral edge side of the substrate while discharging the cleaning liquid and discharging the gas so that a difference between a distance from the discharge position of the second cleaning liquid nozzle to the central portion of the substrate and a distance from the discharge position of the gas nozzle to the central portion of the substrate gradually decreases.
摘要（中）：
在基板旋转的同时，将清洗液和气体顺序地排出到基板的中心部分，在将其排出的喷嘴移动到基板的周缘侧后，将清洗液的排出切换为 第二清洗液喷嘴设置在偏离第一清洗液喷嘴的移动轨迹的位置。 两个喷嘴在排出清洁液体并排出气体的同时朝向基板的周缘侧移动，使得从第二清洗液喷嘴的排出位置到基板的中心部分的距离与距离 从气体喷嘴的排出位置到基板的中央部逐渐减小。
公开/授权文献:
IPC结构图谱:
| H | 电学 |
| --H01 | 基本电气元件 |
| ----H01L | 半导体器件；其他类目未包含的电固体器件 |
| ------H01L21/00 | 专门适用于制造或处理半导体或固体器件或其部件的方法或设备 |
| --------H01L21/67 | .专门适用于在制造或处理过程中处理半导体或电固体器件的装置；专门适合于在半导体或电固体器件或部件的制造或处理过程中处理晶片的装置 |