
基本信息:
- 专利标题: MICROSCOPE AND METHOD FOR CHARACTERIZING STRUCTURES ON AN OBJECT
- 专利标题(中):用于表征对象结构的微观方法和方法
- 申请号:US13908192 申请日:2013-06-03
- 公开(公告)号:US20130321609A1 公开(公告)日:2013-12-05
- 发明人: Holger Seitz , Thomas Frank , Thomas Trautzsch , Norbert Kerwien
- 申请人: Carl Zeiss AG , Carl Zeiss SMS GmbH
- 优先权: DE102012011315.3 20120604
- 主分类号: G02B21/00
- IPC分类号: G02B21/00 ; G02B21/36
摘要:
A microscope includes an illumination unit for illuminating a mask at a predetermined non-axial illumination angle, an imaging unit for imaging an aerial image of the mask within a predetermined defocus region, and an imaging field stop, in which as a result of the lateral displacement of the aerial image depending on the position within the defocus region and on the non-axial illumination angle, the opening of the imaging field stop is dimensioned such that the aerial image is either completely encompassed or circumferentially cut within the defocus region.A method for characterizing a mask having a structure includes illuminating the mask at at least one illumination angle using monochromatic illumination radiation such that a diffraction image of the structure is created, recording the diffraction image, establishing the intensities of the maxima of the adjacent orders of diffraction, and establishing an intensity ratio of the intensities.
摘要(中):
显微镜包括用于以预定的非轴向照明角度照射掩模的照明单元,用于在预定的散焦区域内对掩模的空间图像进行成像的成像单元和成像场停止,其中作为横向 取决于散焦区域内的位置和非轴向照射角度的空间图像的位移,成像场停止件的开口的尺寸被设计成使得空间图像在散焦区域内完全包围或周向切割。 用于表征具有结构的掩模的方法包括:使用单色照射辐射以至少一个照明角度照射掩模,使得产生该结构的衍射图像,记录衍射图像,建立相邻阶数的最大值的强度 衍射,并建立强度的强度比。