基本信息:
- 专利标题： Fe-Pt-Based Ferromagnetic Material Sputtering Target
- 专利标题（中）：基于Fe-Pt的铁磁材料溅射靶
- 申请号：US13816043 申请日：2011-08-05
- 公开(公告)号：US20130168240A1 公开(公告)日：2013-07-04
- 发明人： Shin-ichi Ogino , Yuichiro Nakamura
- 申请人： Shin-ichi Ogino , Yuichiro Nakamura
- 申请人地址： JP Tokyo
- 专利权人： JX NIPPON MINING & METALS CORPORATION
- 当前专利权人： JX NIPPON MINING & METALS CORPORATION
- 当前专利权人地址： JP Tokyo
- 优先权： JP2010-195143 20100831
- 国际申请： PCT/JP2011/067936 WO 20110805
- 主分类号： C23C14/34
- IPC分类号： C23C14/34
摘要：
An Fe—Pt-based ferromagnetic material sputtering target comprising a metal and a metal oxide, wherein the metal has a composition in which Pt is contained in an amount of 5 mol % or more and 60 mol % or less and the remainder is Fe. An object of the present invention is to provide a ferromagnetic material sputtering target, which enables to form a magnetic recording layer composed of a magnetic phase such as an Fe—Pt alloy, and a non-magnetic phase to isolate the magnetic phase, and in which a metal oxide is used as one of the materials for the non-magnetic phase. Provided is a ferromagnetic material sputtering target wherein an inadvertent release of the metal oxide during sputtering and particle generation due to abnormal electrical discharge starting at a void inherently included in the target are suppressed, the adherence between the metal oxide and the matrix alloy is enhanced, and its density is increased.
摘要（中）：
包含金属和金属氧化物的Fe-Pt系铁磁材料溅射靶，其中，所述金属的含量为5摩尔％以上且60摩尔％以下且余量为Fe的组成。 本发明的目的是提供一种铁磁材料溅射靶，其能够形成由诸如Fe-Pt合金的磁相和非磁性相组成的磁记录层以隔离磁相，并且在 其中使用金属氧化物作为非磁性相的材料之一。 本发明提供一种强磁性材料溅射靶，其特征在于，抑制溅射时的金属氧化物的无意的释放以及由于靶内固有地形成的空穴而产生的异常放电而产生的粒子，从而提高了金属氧化物与基体合金之间的粘附性， 其密度增加。
公开/授权文献:
- US09328412B2 Fe—Pt-based ferromagnetic material sputtering target 公开/授权日：2016-05-03