
基本信息:
- 专利标题: POLYMER, GAS SEPARATION MEMBRANE, AND PROCESS FOR PRODUCTION OF POLYMER
- 专利标题(中):聚合物,气体分离膜和聚合物生产方法
- 申请号:US13391086 申请日:2010-08-12
- 公开(公告)号:US20120214949A1 公开(公告)日:2012-08-23
- 发明人: Toshiki Aoki , Masahiro Teraguchi , Takashi Sato , Taketsugu Yamamoto
- 申请人: Toshiki Aoki , Masahiro Teraguchi , Takashi Sato , Taketsugu Yamamoto
- 申请人地址: JP Tokyo JP Niigata-shi, Niigata
- 专利权人: SUMITOMO CHEMICAL COMPANY, LIMITED,NIIGATA UNIVERSITY
- 当前专利权人: SUMITOMO CHEMICAL COMPANY, LIMITED,NIIGATA UNIVERSITY
- 当前专利权人地址: JP Tokyo JP Niigata-shi, Niigata
- 优先权: JP2009-189201 20090818
- 国际申请: PCT/JP2010/063708 WO 20100812
- 主分类号: C08F30/08
- IPC分类号: C08F30/08 ; C08F8/18
摘要:
A polymer having a repeating unit represented by formula (1). [R1 represents a hydrogen atom, a halogeno group, a substituted or unsubstituted alkyl group, a substituted or unsubstituted aromatic hydrocarbon group, a substituted or unsubstituted aromatic heterocyclic group, a trialkylsilyl group, or a trialkylgermyl group, each R2 is independently represented by the following formula (2), m is an integer of from 1 to 5, and when a plurality of R2s are present, the R2s may be the same as or different from each other.] [Each X is independently a monovalent group, and the plurality of Xs may be the same as or different from each other, at least one X is a monovalent group containing a halogen atom, and p is an integer of from 0 to 10.]
摘要(中):
具有式(1)表示的重复单元的聚合物。 [R1表示氢原子,卤代基,取代或未取代的烷基,取代或未取代的芳香族烃基,取代或未取代的芳香族杂环基,三烷基甲硅烷基或三烷基甲基,各自独立地表示为 下式(2)中,m为1〜5的整数,当存在多个R 2时,R 2可以相同也可以不同。[各X独立地为1价基团, 多个X可以彼此相同或不同,至少一个X是含有卤素原子的一价基团,p是0至10的整数。]
IPC结构图谱:
C | 化学;冶金 |
--C08 | 有机高分子化合物;其制备或化学加工;以其为基料的组合物 |
----C08F | 仅用碳—碳不饱和键反应得到的高分子化合物 |
------C08F30/00 | 具有1个或更多的不饱和脂族基化合物的均聚物或共聚物,每个不饱和脂族基只有1个碳—碳双键,并且含有磷、硒、碲或一种金属 |
--------C08F30/04 | .含金属 |
----------C08F30/08 | ..含硅 |