发明申请
US20100159122A1 DEPOSITION FILM FORMING APPARATUS, DEPOSITION FILM FORMING METHOD AND ELECTROPHOTOGRAPHIC PHOTOSENSITIVE MEMBER MANUFACTURING METHOD
审中-公开
基本信息:
- 专利标题： DEPOSITION FILM FORMING APPARATUS, DEPOSITION FILM FORMING METHOD AND ELECTROPHOTOGRAPHIC PHOTOSENSITIVE MEMBER MANUFACTURING METHOD
- 专利标题（中）：沉积膜形成装置，沉积膜形成方法和电泳图像感光构件制造方法
- 申请号：US12627125 申请日：2009-11-30
- 公开(公告)号：US20100159122A1 公开(公告)日：2010-06-24
- 发明人： Kazuto Hosoi , Kazuyoshi Akiyama , Yukihiro Abe , Motoya Yamada
- 申请人： Kazuto Hosoi , Kazuyoshi Akiyama , Yukihiro Abe , Motoya Yamada
- 申请人地址： JP Tokyo
- 专利权人： CANON KABUSHIKI KAISHA
- 当前专利权人： CANON KABUSHIKI KAISHA
- 当前专利权人地址： JP Tokyo
- 优先权： JP2008-324205 20081219
- 主分类号： C23C16/44
- IPC分类号： C23C16/44 ; C23C16/00
摘要：
The present invention provides a deposition film forming apparatus including a reaction container, an exhaust device and an exhaust gas flow path for causing a material gas to flow from the reaction container to the exhaust device, wherein the exhaust gas flow path includes a portion whose cross section expands with a step with respect to a direction in which the material gas flows and the deposition film forming apparatus further includes a cleaning gas flow device for causing the cleaning gas to directly flow into a region closer to the exhaust device side than the step of the exhaust gas flow path, a deposition film forming method using the deposition film forming apparatus and a method of manufacturing an electrophotographic photosensitive member using the deposition film forming method.
摘要（中）：
本发明提供了一种沉积膜形成装置，其包括反应容器，排气装置和用于使材料气体从反应容器流向排气装置的排气流路，其中废气流路包括交叉 截面相对于材料气体流动的方向以阶梯方式膨胀，并且沉积膜形成装置还包括清洁气体流动装置，用于使清洁气体直接流入比排气装置侧更靠近排气装置侧的区域 废气流路，使用沉积膜形成装置的沉积膜形成方法和使用沉积膜形成方法制造电子照相感光构件的方法。