发明申请
US20090123870A1 METHOD OF AND SYSTEM FOR ELECTON BEAM LITHOGRAPHY OF MICRO-PATTERN AND DISC SUBSTRATE HAVING MICRO-PATTERN TO BE TRANSFERRED
审中-公开
![METHOD OF AND SYSTEM FOR ELECTON BEAM LITHOGRAPHY OF MICRO-PATTERN AND DISC SUBSTRATE HAVING MICRO-PATTERN TO BE TRANSFERRED](/abs-image/US/2009/05/14/US20090123870A1/abs.jpg.150x150.jpg)
基本信息:
- 专利标题: METHOD OF AND SYSTEM FOR ELECTON BEAM LITHOGRAPHY OF MICRO-PATTERN AND DISC SUBSTRATE HAVING MICRO-PATTERN TO BE TRANSFERRED
- 专利标题(中):具有要转移的微图案的微图案和盘基底的电子束光刻方法和系统
- 申请号:US12269912 申请日:2008-11-13
- 公开(公告)号:US20090123870A1 公开(公告)日:2009-05-14
- 发明人: Toshihiro USA , Kazunori Komatsu
- 申请人: Toshihiro USA , Kazunori Komatsu
- 申请人地址: JP TOKYO
- 专利权人: FUJIFILM CORPORATION
- 当前专利权人: FUJIFILM CORPORATION
- 当前专利权人地址: JP TOKYO
- 优先权: JP2007-293975 20071113
- 主分类号: G03F7/20
- IPC分类号: G03F7/20 ; G11B5/82 ; G21K5/04
摘要:
An electron beam lithographic method and system for forming a micro-pattern, including servo patterns each of which comprises a plurality of recessed servo elements in a track and groove patterns each of which comprises an inter-track groove extending along the track and to be formed on a discrete track medium, on the a resist coated disc substrate by scanning the resist-coated surface with an electron beam during rotation of the disc substrate. A sequential process of the electron beam lithography comprises the steps of forming the servo elements as an latent image in the resist-coated surface with an electron beam having an irradiation spot diameter smaller than a width of the servo element during rotation of the disc substrate and, subsequently, forming the inter-track grooves in a latent image in the resist-coated surface by intermittently scanning the resist-coated surface in a direction perpendicular to a track direction at regular intervals during rotation of the disc substrate so as thereby to form a continuous row of groove elements into which the inter-track groove is divided.
摘要(中):
一种用于形成微图案的电子束光刻方法和系统,包括伺服图案,每个伺服图案包括轨道和凹槽图案中的多个凹陷的伺服元件,每个凹槽的伺服元件包括沿着轨道延伸并形成的轨道间槽 在离散的轨道介质上,通过在盘基片旋转期间用电子束扫描抗蚀剂涂覆的表面,在抗蚀剂涂覆的盘基片上。 电子束光刻的顺序过程包括以下步骤:在光刻胶涂覆表面中形成具有照射光点直径小于光盘基片旋转期间的光阑直径的电子束的潜像的伺服元件,以及 随后,通过在盘基板的旋转期间以规则的间隔在垂直于轨道方向的方向间歇地扫描抗蚀剂涂覆表面,在抗蚀剂涂覆的表面中形成潜像中的轨道间凹槽,从而形成 连续排的槽元件,分隔槽间槽。