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    • 4. 发明申请
    • METHOD OF AND SYSTEM FOR ELECTON BEAM LITHOGRAPHY OF MICRO-PATTERN AND DISC SUBSTRATE HAVING MICRO-PATTERN TO BE TRANSFERRED
    • 具有要转移的微图案的微图案和盘基底的电子束光刻方法和系统
    • US20090123870A1
    • 2009-05-14
    • US12269912
    • 2008-11-13
    • Toshihiro USAKazunori Komatsu
    • Toshihiro USAKazunori Komatsu
    • G03F7/20G11B5/82G21K5/04
    • G11B5/82B82Y10/00B82Y40/00G11B5/5965G11B5/59688G11B5/743G11B9/10H01J37/3174H01J2237/20
    • An electron beam lithographic method and system for forming a micro-pattern, including servo patterns each of which comprises a plurality of recessed servo elements in a track and groove patterns each of which comprises an inter-track groove extending along the track and to be formed on a discrete track medium, on the a resist coated disc substrate by scanning the resist-coated surface with an electron beam during rotation of the disc substrate. A sequential process of the electron beam lithography comprises the steps of forming the servo elements as an latent image in the resist-coated surface with an electron beam having an irradiation spot diameter smaller than a width of the servo element during rotation of the disc substrate and, subsequently, forming the inter-track grooves in a latent image in the resist-coated surface by intermittently scanning the resist-coated surface in a direction perpendicular to a track direction at regular intervals during rotation of the disc substrate so as thereby to form a continuous row of groove elements into which the inter-track groove is divided.
    • 一种用于形成微图案的电子束光刻方法和系统,包括伺服图案,每个伺服图案包括轨道和凹槽图案中的多个凹陷的伺服元件,每个凹槽的伺服元件包括沿着轨道延伸并形成的轨道间槽 在离散的轨道介质上,通过在盘基片旋转期间用电子束扫描抗蚀剂涂覆的表面,在抗蚀剂涂覆的盘基片上。 电子束光刻的顺序过程包括以下步骤:在光刻胶涂覆表面中形成具有照射光点直径小于光盘基片旋转期间的光阑直径的电子束的潜像的伺服元件,以及 随后,通过在盘基板的旋转期间以规则的间隔在垂直于轨道方向的方向间歇地扫描抗蚀剂涂覆表面,在抗蚀剂涂覆的表面中形成潜像中的轨道间凹槽,从而形成 连续排的槽元件,分隔槽间槽。
    • 5. 发明申请
    • ELECTRON BEAM LITHOGRAPHY APPARATUS AND METHOD FOR COMPENSATING FOR ELECTRON BEAM MISALIGNMENT
    • 电子束光刻设备和电子束误差补偿方法
    • US20080054188A1
    • 2008-03-06
    • US11851188
    • 2007-09-06
    • Toshihiro USAKazunori Komatsu
    • Toshihiro USAKazunori Komatsu
    • H01J3/14
    • H01J37/3026B82Y10/00B82Y40/00H01J37/1472H01J37/3045H01J37/3174H01J2237/30461Y10S430/143
    • Linear movement direction of the stage and the actual deflection direction of the electron beam deflected by the first command signal for deflecting the electron beam in the linear movement direction of the stage do not necessarily align with each other for reasons such as the disposition precision of the stage driving device, a lens system, and the deflecting device. Therefore, the first command signal output from the first command device is processed based on the angle between the linear movement direction of the stage driven by the stage driving device and the deflection direction of the electron beam deflected by the first command signal so that the deflection direction of the electron beam aligns with the linear movement direction of the stage. With this processed first command signal, the deflection direction of the electron beam can be changed (rotated) to align with the linear movement direction of the stage.
    • 由于第一命令信号偏转的电子束的线性运动方向和用于使电子束沿着平台的线性移动方向偏转的实际偏转方向,不一定对准,原因如 舞台驱动装置,透镜系统和偏转装置。 因此,从第一指令装置输出的第一命令信号基于由载物台驱动装置驱动的载物台的线性移动方向与由第一命令信号偏转的电子束的偏转方向之间的角度被处理,使得偏转 电子束的方向与载物台的线性运动方向对齐。 利用该处理的第一命令信号,可以改变(旋转)电子束的偏转方向以与平台的线性移动方向对齐。
    • 7. 发明申请
    • METHOD FOR TESTNG MOLD STRUCTURE, MOLD STRUCTURE, AND MAGNETIC RECORDING MEDIUM
    • 测试模具结构,模具结构和磁记录介质的方法
    • US20100149673A1
    • 2010-06-17
    • US12636145
    • 2009-12-11
    • Kenji ICHIKAWAAtsushi TATSUGAWAToshihiro USA
    • Kenji ICHIKAWAAtsushi TATSUGAWAToshihiro USA
    • G11B27/36
    • G11B27/36G11B5/855G11B2220/2516
    • A method for testing a mold structure including magnetically transferring a magnetic signal according to a concavo-convex pattern for a servo area in a mold structure to a perpendicular magnetic recording medium; electrically reproducing ≧50 tracks of the magnetic signal of servo data transferred onto the perpendicular magnetic recording medium using a magnetic head to obtain a reproduction signal; and calculating a pattern drawing accuracy radially from the reproduction signal to evaluate a performance of the mold structure including a disc-shaped base material; and the concavo-convex pattern for the servo area and a concavo-convex pattern for a data area formed on a base material surface following a desired design pattern. The concavo-convex patterns for the servo area are aligned in the radial direction of the base material, and the concavo-convex pattern for the data area are aligned in the circumferential direction between the concavo-convex patterns for the servo area.
    • 一种用于测试模具结构的方法,包括根据用于模具结构中的伺服区域的垂直磁记录介质的凹凸图案磁转移磁信号; 使用磁头电磁再现传送到垂直磁记录介质上的伺服数据的磁信号的50个磁道,以获得再现信号; 并从再现信号径向计算图形绘制精度,以评估包括盘形基材的模具结构的性能; 以及用于伺服区域的凹凸图案和在所需设计图案之后形成在基材表面上的数据区域的凹凸图案。 伺服区域的凹凸图案在基材的径向上排列,数据区域的凹凸图案在伺服区域的凹凸图案之间的圆周方向上排列。
    • 9. 发明申请
    • ELECTRON BEAM LITHOGRAPHY METHOD AND METHOD FOR PRODUCING A MOLD
    • 电子束光刻方法及其制造方法
    • US20110053088A1
    • 2011-03-03
    • US12868215
    • 2010-08-25
    • Toshihiro USASatoshi CHAIIkuo TAKANO
    • Toshihiro USASatoshi CHAIIkuo TAKANO
    • G03F7/20
    • G03F7/0002B82Y10/00B82Y40/00G03F7/0017H01J2237/30477H01J2237/3175
    • Fine patterns to be formed on recording media such as DTM or BPM are drawn onto a mold original plate, on which resist is coated, by scanning an electron beam with an electron beam lithography apparatus. At this time, at least two types of patterns from among a group of: first patterns of protrusions and recesses constituted by media servo patterns and group patterns among data tracks; second patterns of protrusions and recesses constituted by annular positioning marks formed along the circumference of the mold as annular patterns and product identifying marks for tracing products; and third patterns of protrusions and recesses constituted by point like orientation marks used during transfer from the mold to the recording media are continuously drawn onto a single mold original plate within a single vacuum chamber by electron beam lithography.
    • 在诸如DTM或BPM的记录介质上形成的精细图案通过用电子束光刻设备扫描电子束被绘制在其上涂覆抗蚀剂的模具原版上。 此时,由一组由介质伺服模式构成的突起和凹槽的第一图案和数据轨道中的组图案之间的至少两种图案; 由沿着模具圆周形成的环形定位标记构成的突出和凹陷的第二图案为环形图案和用于跟踪产品的产品识别标记; 并且通过电子束光刻在单个真空室内将单个模具原版板连续地拉伸到在从模具转移到记录介质期间使用的点状取向标记构成的突起和凹槽的第三图案。