发明申请
US20060203346A1 Multilayer substrate, method for producing a multilayer substrate, and device
有权
基本信息:
- 专利标题： Multilayer substrate, method for producing a multilayer substrate, and device
- 申请号：US11368617 申请日：2006-03-07
- 公开(公告)号：US20060203346A1 公开(公告)日：2006-09-14
- 发明人： Hitoshi Noguchi , Atsuhito Sawabe
- 申请人： Hitoshi Noguchi , Atsuhito Sawabe
- 申请人地址： JP TOKYO JP YOKOSUKA-SHI
- 专利权人： SHIN-ETSU CHEMICAL CO., LTD.,ATSUHITO SAWABE
- 当前专利权人： SHIN-ETSU CHEMICAL CO., LTD.,ATSUHITO SAWABE
- 当前专利权人地址： JP TOKYO JP YOKOSUKA-SHI
- 优先权： JP2005-71924 20050314
- 主分类号： G02B1/10
- IPC分类号： G02B1/10
摘要：
There is provided a multilayer substrate comprising, at least, a single crystal MgO substrate, an iridium (Ir) film heteroepitaxially grown on the MgO substrate, a diamond film vapor-deposited on the Ir film, wherein crystallinity of the Ir film is that a full width at half maximum (FWHM) of a diffracted intensity peak in 2 θ=46.5° or 2θ=47.3° attributed to Ir (200) analyzed by X-ray diffraction method with a wavelength of λ=1.54 Å is 0.40° or less. Thereby, there is provided a multilayer substrate that is delamination-proof at the respective interfaces between the MgO substrate and the Ir film and between the Ir film and the diamond film, and, particularly, that has a single crystal diamond film of a large area as a continuous film.
公开/授权文献:
IPC结构图谱:
| G | 物理 |
| --G02 | 光学 |
| ----G02B | 光学元件、系统或仪器 |
| ------G02B1/00 | 按制造材料区分的光学元件；用于光学元件的光学涂层 |
| --------G02B1/10 | .对光学元件表面涂覆或对它进行表面处理后所产生的光学涂层 |