发明申请
US20060086954A1 Multi-layer film stack for extinction of substrate reflections during patterning
审中-公开
基本信息:
- 专利标题： Multi-layer film stack for extinction of substrate reflections during patterning
- 申请号：US11297390 申请日：2005-12-07
- 公开(公告)号：US20060086954A1 公开(公告)日：2006-04-27
- 发明人： Sanjay Natarajan , Sean King , Khaled Elamrawi
- 申请人： Sanjay Natarajan , Sean King , Khaled Elamrawi
- 主分类号： H01L29/76
- IPC分类号： H01L29/76
摘要：
A method including introducing a dielectric layer over a substrate between an interconnection line and the substrate, the dielectric layer comprising a plurality of alternating material layers; and patterning an interconnection to the substrate. An apparatus comprising a substrate comprising a plurality of devices formed thereon; and an interlayer dielectric layer comprising a base layer and a cap layer, the cap layer comprising a plurality of alternating material layers overlying the substrate.