基本信息:
- 专利标题: 輻射敏感性樹脂組成物
- 专利标题(英):Radiation-sensitive resin composition
- 专利标题(中):辐射敏感性树脂组成物
- 申请号:TW091137874 申请日:2002-12-30
- 公开(公告)号:TWI278720B 公开(公告)日:2007-04-11
- 发明人: 岩永伸一郎 IWANAGA, SHINICHIRO , 岩本聰 IWAMOTO, SATOSHI , 木村徹 KIMURA, TOORU , 西村洋子 NISHIMURA, HIROKO , 西川耕二 NISHIKAWA, KOJI
- 申请人: JSR股份有限公司 JSR CORPORATION
- 申请人地址: 日本
- 专利权人: JSR股份有限公司 JSR CORPORATION
- 当前专利权人: JSR股份有限公司 JSR CORPORATION
- 当前专利权人地址: 日本
- 代理人: 林志剛
- 优先权: 日本 2002-040301 20020218
- 主分类号: G03F
- IPC分类号: G03F
This invention provides a radiation-sensitive resin composition comprising (A) an alkali-soluble resin having unsaturated groups which is obtained by reacting 100 parts by weight of a copolymer comprising 1 to 40 wt% of constituent units derived from a radical-polymerizable compound (a) having a carboxyl group, 1 to 50 wt% of constituent units having phenolic hydroxyl groups which are derived from a radical-polymerizable compound (b-1) having a phenolic hydroxyl group or a radical-polymerizable compound (b-2) having a functional group which can be converted into phenolic hydroxyl after the formation of the copolymer, and the balance of constituent units derived from other radical-polymerizable compound (c) with 0.1 to 20 parts by weight of a radical-polymerizable compound (d) having an epoxy group, (B) a compound having at least one ethylenically unsaturated double bond, and (C) a polymerization initiator for radiation-initiated radical polymerization. The composition is characterized by forming a radiation-sensitive resin coating film having a thickness larger than the height of a deposit and high resolution.
公开/授权文献:
- TW200305778A 輻射敏感性樹脂組成物 公开/授权日:2003-11-01