基本信息:
- 专利标题： 外觀件及其製作方法
- 专利标题（英）：Appearance and manufacturing method thereof
- 专利标题（中）：外观件及其制作方法
- 申请号：TW105122835 申请日：2016-07-20
- 公开(公告)号：TW201803740A 公开(公告)日：2018-02-01
- 发明人： 洪文慶 , HUNG, WEN-CHING , 傅旭文 , FU, HSU-WEN , 藍士傑 , LAN, SHIH-CHIEH , 陳富偉 , CHEN, FU-WEI
- 申请人： 銳捷科技股份有限公司 , RIGIDTECH MICROELECTRONICS CORP.
- 申请人地址： 桃園市
- 专利权人： 銳捷科技股份有限公司,RIGIDTECH MICROELECTRONICS CORP.
- 当前专利权人： 銳捷科技股份有限公司,RIGIDTECH MICROELECTRONICS CORP.
- 当前专利权人地址： 桃園市
- 代理人： 葉璟宗; 卓俊傑
- 主分类号： B44C5/08
- IPC分类号： B44C5/08 ; H05K5/02
An appearance including a transparent substrate, a plurality of transparent micro-structures, and a reflective layer is provided. The appearance has a pattern region. The pattern region has a plurality of sub-pattern regions. The sub-pattern regions include at least a first sub-pattern region and a second sub-pattern region. The transparent micro-structures are respectively disposed in the sub-pattern regions. In the first sub-pattern region, each set of two adjacent transparent micro-structures has a first gap. In the second sub-pattern region, each set of two adjacent transparent micro-structures has a second gap. The first gap is different from the second gap. The height of the transparent micro-structures in the first sub-pattern region is different from the height the transparent micro-structures in the second sub-pattern region. The reflective layer covers a surface of the transparent micro-structures which is not in contact with the transparent substrate. Besides, a manufacturing method of the appearance is also provided.