基本信息:
- 专利标题： 廢氣處理裝置
- 专利标题（英）：Exhaust gas treating device
- 专利标题（中）：废气处理设备
- 申请号：TW105117181 申请日：2016-06-01
- 公开(公告)号：TW201714662A 公开(公告)日：2017-05-01
- 发明人： 宮崎一知 , MIYAZAKI, KAZUTOMO , 駒井哲夫 , KOMAI, TETSUO , 篠原豊司 , SHINOHARA, TOYOJI , 柏木誠司 , KASHIWAGI, SEIJI
- 申请人： 荏原製作所股份有限公司 , EBARA CORPORATION
- 专利权人： 荏原製作所股份有限公司,EBARA CORPORATION
- 当前专利权人： 荏原製作所股份有限公司,EBARA CORPORATION
- 代理人： 洪武雄; 陳昭誠
- 优先权： 2015-213909 20151030
- 主分类号： B01D53/46
- IPC分类号： B01D53/46 ; B01D53/68 ; F23G7/06
This invention relates to an exhaust gas treating device for conducting a burning treatment of an exhaust gas released from manufacturing devices and the like for producing semiconductor elements, liquid crystal, LED and the likes, to render the treated gas harmless. This invention provides an exhaust gas treating device by burning the exhaust gas, to render the treated gas harmless, wherein, the exhaust gas treating device has a cylindrical combustion chamber (1): which contains a fuel nozzle (3A), a combustion supporting gas nozzle (3B) and a treating gas nozzle (3C) respectively introducing the fuel, the combustion supporting gas and the treating gas in to the combustion chamber in a direction of the tangent line of the inner periphery. The fuel nozzle (3A), the combustion supporting gas nozzle (3B) and the treating gas nozzle (3C) are provided on a plane orthogonal to the axis of the combustion chamber (1).
公开/授权文献:
- TWI680792B 廢氣處理裝置 公开/授权日：2020-01-01
信息查询:
EspacenetIPC结构图谱:
| B01D53/34 | 组优先于B01D53/02至B01D53/32组。 |
| --B01D53/46 | ..除去已知结构的组分 |