基本信息:
- 专利标题: 臭氧氣體溶解水之製造方法及電子材料之洗淨方法
- 专利标题(英):Method for manufacturing ozone-gas-dissolved water and cleaning method for electronic materials
- 专利标题(中):臭氧气体溶解水之制造方法及电子材料之洗净方法
- 申请号:TW102138254 申请日:2013-10-23
- 公开(公告)号:TW201431797A 公开(公告)日:2014-08-16
- 发明人: 床嶋裕人 , TOKOSHIMA, HIROTO , 森田博志 , MORITA, HIROSHI
- 申请人: 栗田工業股份有限公司 , KURITA WATER INDUSTRIES LTD.
- 专利权人: 栗田工業股份有限公司,KURITA WATER INDUSTRIES LTD.
- 当前专利权人: 栗田工業股份有限公司,KURITA WATER INDUSTRIES LTD.
- 代理人: 林志剛
- 优先权: 2012-241891 20121101
- 主分类号: C02F1/78
- IPC分类号: C02F1/78 ; C02F1/66 ; B08B3/12
The purpose of the present invention is to manufacture ozone-gas-dissolved water that has a high concentration of ozone gas in solution and which suppresses bubbling of oxygen gas in the place of use. Using the manufactured ozone-gas-dissolved water, electronic materials can be cleaned efficiently, avoiding problems with uneven cleaning and mechanical breakage caused by air bubbles. When the ozone-gas-dissolved water is manufactured by supplying a mixed gas of ozone gas and oxygen gas and deaerated water into an ozone dissolution unit and dissolving the mixed gas in the supplied water, the amount of mixed gas supplied to the ozone dissolution unit is controlled so that the total of the amount of oxygen gas dissolved in the supplied water, and the amount of oxygen gas in the mixed gas in a case where all of the ozone in the mixed gas has broken down into oxygen, is equal to or less than the saturation solubility of the oxygen gas, under the use conditions of the ozone-gas-dissolved water that has been obtained.
公开/授权文献:
- TWI601695B 臭氧氣體溶解水之製造方法及電子材料之洗淨方法 公开/授权日:2017-10-11
信息查询:
EspacenetIPC结构图谱:
C | 化学;冶金 |
--C02 | 水、废水、污水或污泥的处理 |
----C02F | 水、废水、污水或污泥的处理 |
------C02F1/00 | 水、废水或污水的处理C02F3/00至C02F9/00优先 |
--------C02F1/72 | .氧化法 |
----------C02F1/78 | ..用臭氧 |