基本信息:
- 专利标题： 電漿成膜裝置、結晶太陽電池與半導體元件
- 专利标题（英）：Plasma film forming apparatus, crystal solar cell and semiconductor element
- 专利标题（中）：等离子成膜设备、结晶太阳电池与半导体组件
- 申请号：TW101135387 申请日：2012-09-26
- 公开(公告)号：TW201321550A 公开(公告)日：2013-06-01
- 发明人： 鈴木正康 , SUZUKI, MASAYASU , 三科健 , MISHINA, KEN , 猿渡哲也 , SARUWATARI, TETSUYA
- 申请人： 島津製作所股份有限公司 , SHIMADZU CORPORATION
- 专利权人： 島津製作所股份有限公司,SHIMADZU CORPORATION
- 当前专利权人： 島津製作所股份有限公司,SHIMADZU CORPORATION
- 代理人： 詹銘文
- 优先权： PCT/JP2011/071796 20110926;PCT/JP2011/074318 20111021
- 主分类号： C23C16/54
- IPC分类号： C23C16/54 ; C23C16/455
A plasma film forming apparatus including a chamber, a cathode electrode, an air supplying device and an alternating current power source, is provided. A substrate holder is carried in the chamber, and the substrate holder has a carrying surface for carrying a substrate. The cathode electrode is disposed in a way it is opposite to the carrying surface, and the carrying surface is extended in an up-down direction in the chamber. The air supplying device introduces a processing gas between the substrate holder and the cathode electrode in the chamber. The alternating current power source provides an alternating current electricity between the substrate holder and the cathode electrode for making the processing gas be in plasma state between the substrate holder and the cathode electrode. Therefore, a film with a raw material contained in the processing gas as the major component is formed on the substrate.
公开/授权文献:
- TWI494466B 電漿成膜裝置、結晶太陽電池與半導體元件 公开/授权日：2015-08-01