基本信息:
- 专利标题： 顯影裝置、顯影方法及記憶媒體 DEVELOPING DEVICE, DEVELOPING METHOD AND STORAGE MEDIUM
- 专利标题（英）：Developing device, developing method and storage medium
- 专利标题（中）：显影设备、显影方法及记忆媒体 DEVELOPING DEVICE, DEVELOPING METHOD AND STORAGE MEDIUM
- 申请号：TW099107295 申请日：2010-03-12
- 公开(公告)号：TW201033759A 公开(公告)日：2010-09-16
- 发明人： 有馬裕 , 吉田勇一 , 山本太郎 , 吉原孝介
- 申请人： 東京威力科創股份有限公司
- 申请人地址： TOKYO ELECTRON LIMITED 日本 JP
- 专利权人： 東京威力科創股份有限公司
- 当前专利权人： 東京威力科創股份有限公司
- 当前专利权人地址： TOKYO ELECTRON LIMITED 日本 JP
- 代理人： 周良謀; 周良吉
- 优先权： 日本 2009-062087 20090313
- 主分类号： G03F
- IPC分类号： G03F ; H01L
A developing device is composed of a substrate holding portion that holds a substrate horizontally after resist is applied to the surface of the substrate and exposed, a surface-treatment liquid atomization means that atomizes surface-treatment liquid to improve wettability to the substrate of developer solution, a first spray nozzle that sprays the misty surface-treatment liquid to the substrate, and a developer solution dispensing nozzle to dispense the developer solution to the substrate to which sprayed the misty surface-treatment liquid and to develop the substrate. As the surface tension to the substrate of the misty surface-treatment liquid is lower than that of the surface-treatment liquid in the form of liquid, it is able to be suppressed that the surface-treatment liquid coheres on the substrate. The surface-treatment liquid can be easily supplied to the entire substrate, and the wettability of the substrate can be improved. As a result, the developer solution can be supplied to the substrate by the high uniformity, and the decrease in the yield can be suppressed.
公开/授权文献:
- TWI418956B 顯影裝置、顯影方法及記憶媒體 公开/授权日：2013-12-11