基本信息:
- 专利标题： 一種微奈米結構轉印裝置及方法
- 专利标题（英）：Device of nano-structure imprint for pattern transfer and method of the same
- 专利标题（中）：一种微奈米结构转印设备及方法
- 申请号：TW093116364 申请日：2004-06-08
- 公开(公告)号：TW200540103A 公开(公告)日：2005-12-16
- 发明人： 王維漢 WANG, WEI HAN , 林家弘 LIN, CHIA HUNG , 何侑倫 , 巫震華 WU, JEN HUA
- 申请人： 財團法人工業技術研究院 INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
- 申请人地址： 新竹縣竹東鎮中興路4段195號
- 专利权人： 財團法人工業技術研究院 INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
- 当前专利权人： 財團法人工業技術研究院 INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
- 当前专利权人地址： 新竹縣竹東鎮中興路4段195號
- 代理人： 何文淵
- 主分类号： B81C
- IPC分类号： B81C
The nano-structure imprint device of the invention comprises: a supporting plate, a substrate, a moldable layer, a mold, and a microwave source, wherein the microwave discharged from the microwave source is being provided to the substrate, the moldable layer and the mold for heating up the moldable layer so as to soften the moldable layer, and the substrate having a layer of moldable layer arranged thereon is being placed on the supporting plate, and the mold is disposed at a position corresponding to the substrate and the supporting plate such that the mold can be pressed on the moldable layer for pattern transferring. The device the present invention is capable of enhancing the thermal state of a moldable layer in a short time by means of electromagnetic wave, such that the moldable layer can be heated in a short time and further the moldable layer can be softened.
公开/授权文献:
- TWI243796B 一種微奈米結構轉印裝置及方法 公开/授权日：2005-11-21