A method for manufacturing a display device can include forming a thin-film transistor (TFT) array substrate including data lines, gate lines, TFTs at intersections of the data lines and the gate lines, common electrodes, common lines disposed parallel to the gate lines, and connected to the common electrodes, a protective layer on the gates lines, the common lines and the data lines, and a first protrusion protruding from the protective layer; and forming a color filter array substrate including first, second and third color filter layers corresponding to first, second and third sub-pixels, respectively, in which portions of the first, second and third color filer layers overlap each other in an area between two adjacent rows of sub-pixels to form a second protrusion, and the second protrusion overlaps with both one common line among the plurality of common lines and one gate line among the gate lines that is adjacent to the one common line, and the area between the two adjacent rows of sub-pixels is configured to block light leakage from the corresponding adjacent sub-pixels.