基本信息:
- 专利标题： 코발트의 데미지를 억제한 반도체 소자의 세정액, 및 이것을 이용한 반도체 소자의 세정방법
- 专利标题（英）：SEMICONDUCTOR ELEMENT CLEANING SOLUTION THAT SUPPRESSES DAMAGE TO COBALT AND METHOD FOR CLEANING SEMICONDUCTOR ELEMENT USING SAME
- 申请号：KR1020177008629 申请日：2015-10-02
- 公开(公告)号：KR102398801B1 公开(公告)日：2022-05-17
- 优先权： JPJP-P-2014-230636 2014-11-13
- 国际申请： PCT/JP2015/078077 2015-10-02
- 国际公布： WO2016076033 2016-05-19
- 主分类号： C11D11/00
- IPC分类号： C11D11/00 ; C11D3/00 ; C11D3/04 ; C11D3/30 ; C11D3/28
摘要：
본발명에따르면, (1)코발트또는코발트합금을포함하는재료, 혹은 (2)코발트또는코발트합금및 텅스텐을포함하는재료와, 저유전율층간절연막을갖는반도체소자의표면의드라이에칭잔사를제거하는세정액으로서, 알칼리금속화합물 0.001~7질량%, 과산화물 0.005~35질량%, 방식제 0.005~10질량%, 알칼리토류금속화합물 0.000001~1질량% 및물을포함하는, 상기세정액을제공할수 있다.
摘要（英）：
According to the present invention, it is possible to provide a cleaning solution which removes a dry etching residue on a surface of a semiconductor element that includes: (1) a material containing cobalt or a cobalt alloy or (2) a material containing cobalt or a cobalt alloy and tungsten; and a low-dielectric constant interlayer dielectric film. The cleaning solution contains 0.001-7 mass % of an alkali metal compound, 0.005-35 mass % of a peroxide, 0.005-10 mass % of an anti-corrosion agent, 0.000001-1 mass % of an alkaline earth metal compound, and water.
公开/授权文献:
- KR1020170083025A 코발트의 데미지를 억제한 반도체 소자의 세정액, 및 이것을 이용한 반도체 소자의 세정방법 公开/授权日：2017-07-17
信息查询:
EspacenetIPC结构图谱:
| C | 化学；冶金 |
| --C11 | 动物或植物油、脂、脂肪物质或蜡；由此制取的脂肪酸；洗涤剂；蜡烛 |
| ----C11D | 洗涤剂组合物；用单一物质作为洗涤剂；皂或制皂；树脂皂；甘油的回收 |
| ------C11D11/00 | 制备含洗涤剂混合物之组合物的特殊方法 |