基本信息:
- 专利标题： 광학 이미징 장치의 모델 기반 제어
- 专利标题（英）：MODEL-BASED CONTROL OF AN OPTICAL IMAGING DEVICE
- 申请号：KR1020157026275 申请日：2014-02-28
- 公开(公告)号：KR102250672B1 公开(公告)日：2021-05-12
- 发明人： 하우프마르쿠스 , 로텐회퍼게랄트
- 申请人： 칼 짜이스 에스엠테 게엠베하
- 申请人地址： Rudolf-Eber-Strasse *, ***** Oberkochen, Germany
- 专利权人： 칼 짜이스 에스엠테 게엠베하
- 当前专利权人： 칼 짜이스 에스엠테 게엠베하
- 当前专利权人地址： Rudolf-Eber-Strasse *, ***** Oberkochen, Germany
- 代理人： 노대웅; 양영준
- 优先权： DE10 2013 203 3389 2013-02-28; US61/770,400 2013-02-28
- 国际申请： PCT/EP2014/053955 2014-02-28
- 国际公布： WO2014131889 2014-09-04
- 主分类号： G03F7/20
- IPC分类号： G03F7/20 ; G02B7/00 ; G02B7/02
The disclosure provides a method of determining an actual input value of an input variable for a control unit of a microlithography imaging device. The actual input value is assigned to a first location of the microlithography optical imaging device. The method includes: a) detecting, at a second location of the microlithography optical imaging device, an actual detection value of a detection variable of a detection device of the microlithography optical imaging device; b) using a second relation to computationally ascertain an actual computational value of the detection variable at the second location; c) comparing the actual computational value of the detection variable with the actual detection value of the detection variable to provide a result; and d) based on the result in c), using a relationship between a first predefinable relation and the second relation to correct the predefinable first relation.
公开/授权文献:
- KR1020150122722A 광학 이미징 장치의 모델 기반 제어 公开/授权日：2015-11-02