基本信息:
- 专利标题： OLED 화소 증착을 위한 금속재의 증착용 마스크 및 이의 제조방법
- 专利标题（英）：KR20210038528A - A deposition mask of metal plate material for oled pixel deposition and method for manufacturing of the same
- 申请号：KR1020210042295 申请日：2021-03-31
- 公开(公告)号：KR1020210038528A 公开(公告)日：2021-04-07
- 发明人： 김해식 , 백지흠
- 申请人： 엘지이노텍 주식회사
- 申请人地址： *, Magokjungang *-ro, Ga...
- 专利权人： 엘지이노텍 주식회사
- 当前专利权人： 엘지이노텍 주식회사
- 当前专利权人地址： *, Magokjungang *-ro, Ga...
- 代理人： 허용록
- 主分类号： H01L51/56
- IPC分类号： H01L51/56 ; H01L51/00
In the deposition mask of a metal material for deposition of an OLED pixel according to an embodiment, the deposition mask includes a deposition area for forming a deposition pattern and a non-deposition area other than the deposition area, and the deposition area is spaced apart in a length direction. A plurality of effective portions and non-effective portions other than the effective portions, wherein the effective portions include: a plurality of small face holes formed on one surface; A plurality of facing holes formed on the other surface opposite to the one surface; A through hole communicating the small surface hole and the facing hole; And an island portion between the plurality of through-holes, wherein the through-hole has a diameter of 33 μm or less, and has a resolution of 500 PPI or more in which the distance between the through-holes is 48 μm or less, It is 89 degrees, and the radius of curvature of the inclination of the small surface hole with respect to the one surface is 3 μm to 86 μm.
The mask for deposition of a metal material for deposition of an OLED pixel according to the embodiment includes: a first step of preparing a base metal plate having a thickness of 20 μm to 30 μm; A patterned photoresist layer is disposed on one surface of the base metal plate, and a groove is formed on one surface of the base metal plate by half-etching the open portion of the toresist layer, and on the other surface opposite to the one surface of the base metal plate. A second step of disposing a patterned photoresist layer on the photoresist layer and etching the open portion of the photoresist layer to form a through hole connected to a groove on one surface of the base metal plate; And by removing the photoresist layer, a through hole formed by a large surface hole formed on the one surface, a small surface hole formed on the other surface opposite to the one surface, and a communication part connecting the boundary between the large surface hole and the small surface hole. It may be manufactured including; a third step of forming a deposition mask including.