基本信息:
- 专利标题: 화합물, 산 발생제, 중합체, 레지스트 조성물 및 레지스트 패턴의 제조 방법
- 专利标题(英):Compound, acid generator, polymer, resist composition and method of producing resist pattern
- 专利标题(中):复合酸发生剂聚合物抗蚀剂组合物和生产抗蚀剂图案的方法
- 申请号:KR20170079184 申请日:2017-06-22
- 公开(公告)号:KR20180001476A 公开(公告)日:2018-01-04
- 优先权: JP2016126019 2016-06-24
- 主分类号: C07D221/14
- IPC分类号: C07D221/14 ; G03F7/004 ; G03F7/029 ; G03F7/038
The compound represented by the formula (I).
In the formula (I),
A
3 is a divalent hydrocarbon group of a carbon number of
2 ~ 36, -CH 2 contained the hydrocarbon groups - is, being optionally substituted by a -O-, -S- or -CO-, hydrogen atoms contained hydrocarbon groups that It is, or may be substituted with a halogen atom or a hydroxyl group.
Q
1 and Q
2 are, each independently, represents an alkyl group with a fluorine atom or a perfluoroalkyl group having 1 to 6 carbon atoms.
R
1 and R
2 are, each independently represents a perfluoroalkyl group of a hydrogen atom, a fluorine atom or a group having 1 to 6 carbon atoms.
z is 0-6 represents an integer that is, when z is 2 or greater, the plurality of R
1 and R
2 may be the same or different from each other.
X
1 is, * 1-CO-O-, * 1-O-CO-, * 1-O-CO-O- or represents -O-, * 1 is
C (R 1) (R 2 ) or C (Q
1) represents a bonding site with (Q
2).
A
1 is, that represents a divalent hydrocarbon group having 2 to 36 which may have a substituent, -CH
2 groups that contained a hydrocarbon-substituted by - is, -O-, -S-, -CO- or -SO
2 It may be.
X
2 is, * 2-CO-O-, * 2-O-CO-O- or represents -O-, * 2 denotes the binding site of the A
1.
R
3 and R
4 are, each independently, represent a hydrogen atom or a saturated hydrocarbon group having 1 to 6 carbon atoms.
X
3 is, represents a group shown by any one of formulas (X
3 -1) ~ expression (X
3 -8).
(Wherein (X
3 -1) ~ expression (X
3 -8),
* Is, C (R
3) represents a bonding site with (R
4).)
R
5 is an alkyl group having 1 to 6 carbon atoms which may have a halogen atom, a hydrogen atom or a halogen atom.]
信息查询:
EspacenetIPC结构图谱:
C | 化学;冶金 |
--C07 | 有机化学 |
----C07D | 杂环化合物 |
------C07D221/00 | 杂环化合物,含六元环、有1个氮原子作为惟一的杂环原子、C07D211/00至C07D219/00各组内不包含的 |
--------C07D221/02 | .与碳环或碳环系稠合 |
----------C07D221/04 | ..邻位或迫位稠合的环系 |
------------C07D221/06 | ...三环环系 |
--------------C07D221/14 | ....氮杂菲那烯,例如,1,8-萘二甲酰亚胺 |