基本信息:
- 专利标题: 필드 향상 요소를 갖는 타겟을 사용하는 광학 계측
- 专利标题(英):Optical metrology using targets with field enhancement elements
- 专利标题(中):使用目标与现场增强元素的光学计量学
- 申请号:KR1020147026252 申请日:2013-02-21
- 公开(公告)号:KR1020140127339A 公开(公告)日:2014-11-03
- 发明人: 매드슨조나단 , 쉬쉐그로브안드레이 , 베이크만마이클 , 지우라새디어스 , 쿠즈넷소브알렉산더 , 트사이빈-밍벤자민
- 申请人: 케이엘에이-텐코 코포레이션
- 申请人地址: One Technology Drive, Milpitas, CA *****, U.S.A.
- 专利权人: 케이엘에이-텐코 코포레이션
- 当前专利权人: 케이엘에이-텐코 코포레이션
- 当前专利权人地址: One Technology Drive, Milpitas, CA *****, U.S.A.
- 代理人: 김태홍
- 优先权: US13/770,202 2013-02-19; US61/603,187 2012-02-24
- 国际申请: PCT/US2013/027180 2013-02-21
- 国际公布: WO2013126601 2013-08-29
- 主分类号: G01B11/00
- IPC分类号: G01B11/00 ; G01B11/30 ; G01B11/24 ; G01N21/47 ; H01L21/66
A method and system for improving the measurement sensitivity to a particular parameter of interest is presented. Field enhancement factor: a (field enhancement element FEE) is configured as a portion of the specimen to enhance measurement sensitivity of the structures of interest present in the specimen. Design of FEE is to consider the measurement target and manufacturing design rule allows the entire device fabrication process is compatible with a target production. Opaque material, the high aspect ratio structure, the structure having a lower sensitivity, or the measurement of a parameter correlated with one another is improved by the addition of FEE. An exemplary measure includes a critical dimension, film thickness, film composition, and the optical spectral optical overlay. In some instances, the target element comprises a different FEE to improve the measurement of the different interest structure. In another embodiment, a different target element comprises a different FEE. In some other instances, the field enhancement element is shaped so as to concentrate the electric field within the multi-layered thin film on the FEE.
信息查询:
EspacenetIPC结构图谱:
G | 物理 |
--G01 | 测量;测试 |
----G01B | 长度、厚度或类似线性尺寸的计量;角度的计量;面积的计量;不规则的表面或轮廓的计量 |
------G01B11/00 | 以采用光学方法为特征的计量设备 |