基本信息:
- 专利标题： 가스 스트림을 처리하기 위한 장치
- 专利标题（英）：Apparatus for treating a gas stream
- 专利标题（中）：处理气流的装置
- 申请号：KR1020147006773 申请日：2012-07-11
- 公开(公告)号：KR1020140064867A 公开(公告)日：2014-05-28
- 发明人： 보로닌세르게이알렉산드로비치 , 클레멘츠크리스토퍼제임스필립 , 비더존레슬리
- 申请人： 에드워즈 리미티드
- 申请人地址： Innovation Drive, Burgess Hill, West Sussex, RH** *TW, United Kingdom
- 专利权人： 에드워즈 리미티드
- 当前专利权人： 에드워즈 리미티드
- 当前专利权人地址： Innovation Drive, Burgess Hill, West Sussex, RH** *TW, United Kingdom
- 代理人： 제일특허법인
- 优先权： GB11141728 2011-08-17
- 国际申请： PCT/GB2012/051630 2012-07-11
- 国际公布： WO2013024247 2013-02-21
- 主分类号： B01D53/32
- IPC分类号： B01D53/32 ; B03C3/78 ; B03C3/82 ; H05H1/24
The present invention relates to a device 10 for treatment of a gas stream (12). The plasma generator 14 generates a plasma flare (16). A first inlet (18) carries a gas stream into the apparatus. The reaction chamber 20 is located downstream of the plasma generator where the gas is processed. A second inlet (22), in order to resist accumulation of solid deposits on the interior surface, and containing a liquid (32) into the device so as to set the liquid weir 24 on the inner surface of the reaction chamber 26. Weir guide 28 and an outer annular surface 30 and the outer surface and the flow inside the annular surface (34) in communication for guiding the liquid on the inner surface, so that the liquid flows to the inner surface from the outer surface, It is resistant to deposition on the inner surface.
公开/授权文献:
- KR101993487B1 가스 스트림을 처리하기 위한 장치 公开/授权日：2019-06-26