基本信息:
- 专利标题： 플라즈마 처리 장치용 유전체창 및 플라즈마 처리 장치
- 专利标题（英）：Dielectric window for plasma treatment device, and plasma treatment device
- 专利标题（中）：用于等离子体处理装置的电介质窗口和等离子体处理装置
- 申请号：KR1020147012364 申请日：2012-11-08
- 公开(公告)号：KR1020140061558A 公开(公告)日：2014-05-21
- 发明人： 티안카이종 , 마츠모토나오키 , 고야마고지 , 미하라나오키 , 다카하시가즈키 , 요시카와준 , 모야마가즈키 , 다니카와다케히로
- 申请人： 도쿄엘렉트론가부시키가이샤
- 申请人地址： *-* Akasaka *-chome, Minato-ku, Tokyo, Japan
- 专利权人： 도쿄엘렉트론가부시키가이샤
- 当前专利权人： 도쿄엘렉트론가부시키가이샤
- 当前专利权人地址： *-* Akasaka *-chome, Minato-ku, Tokyo, Japan
- 代理人： 김태홍; 김성기
- 优先权： JPJP-P-2011-247778 2011-11-11
- 国际申请： PCT/JP2012/079006 2012-11-08
- 国际公布： WO2013069739 2013-05-16
- 主分类号： H05H1/46
- IPC分类号： H05H1/46 ; C23C16/511 ; H01L21/205 ; H01L21/3065
The plasma processing apparatus is a dielectric window, is provided in the plasma processing apparatus in the microwave plasma source, the dielectric window is a disk-shaped, allowing the propagation of a microwave. The plasma processing apparatus the dielectric window, the dielectric window is provided in which the plasma is generated when the time to be provided to the plasma processing apparatus, when the side has an opening, and has a concave indentation in the dielectric window, the plasma treatment apparatus for the sheet thickness direction. That recess, extending in the direction perpendicular to the thickness direction of the bottom surface; Toward the recessed portion opening side from the peripheral edge of the bottom side extending in a thickness direction; And the concave portion toward the opening side from the peripheral edge of the opening of the side surface has an inclined surface which extends inclined with respect to the plate thickness direction.
公开/授权文献:
- KR101420078B1 플라즈마 처리 장치용 유전체창 및 플라즈마 처리 장치 公开/授权日：2014-07-17