基本信息:
- 专利标题： 포토마스크 및 그것을 사용하는 레이저 어닐링 장치 및 노광 장치
- 专利标题（英）：Photomask, and laser annealing device and exposure device which use same
- 专利标题（中）：照相机，激光退火装置及其使用的曝光装置
- 申请号：KR1020127034458 申请日：2011-05-26
- 公开(公告)号：KR1020130113356A 公开(公告)日：2013-10-15
- 发明人： 하타나카마코토 , 이와모토다카미츠 , 하시모토가츠시게
- 申请人： 브이 테크놀로지 씨오. 엘티디
- 申请人地址： *** Godo-Cho, Hodogaya-Ku, Yokohama-shi, Kanagawa ***-**** (JP)
- 专利权人： 브이 테크놀로지 씨오. 엘티디
- 当前专利权人： 브이 테크놀로지 씨오. 엘티디
- 当前专利权人地址： *** Godo-Cho, Hodogaya-Ku, Yokohama-shi, Kanagawa ***-**** (JP)
- 代理人： 박장원
- 优先权： JPJP-P-2010-137976 2010-06-17
- 国际申请： PCT/JP2011/062135 2011-05-26
- 国际公布： WO2011158630 2011-12-22
- 主分类号： G03F1/38
- IPC分类号： G03F1/38 ; G03F1/42 ; H01L21/027 ; G03F7/20
Integral multiple of the invention is an array of a plurality of mask patterns (2), the substrate transport direction of the plurality of patterns formed on a substrate cross-direction to be formed with a certain arrangement pitch in the direction crossing the transport direction of the substrate through the optical pitch and a pair of thin wires have the same spacing formed parallel to the substrate transport direction (4a, 4b) for having forms a structure, each other constant in the substrate transport direction at a position of the substrate conveying direction and opposite to the plurality of mask patterns (2) distance at the same time disposed off, will having a plurality of alignment marks (4) formed by a pair of thin wires (4a, 4b) previously set the reference position is deviated from each other by a predetermined distance in a direction intersecting the board conveyance direction state between . In this way, even if the light is irradiated at a position offset in the cross direction to the substrate transport direction of the same kind of substrate, and it can improve the followability to the substrate being moved.
公开/授权文献:
- KR101780368B1 포토마스크 및 그것을 사용하는 레이저 어닐링 장치 및 노광 장치 公开/授权日：2017-09-21