基本信息:
- 专利标题： ＲＦ 스퍼터링 장치
- 专利标题（英）：Rf sputtering arrangement
- 专利标题（中）：RF溅射装置
- 申请号：KR1020117011767 申请日：2009-11-20
- 公开(公告)号：KR1020110097781A 公开(公告)日：2011-08-31
- 发明人： 크라저마틴
- 申请人： 에바텍 어드벤스드 테크놀로지스 아크티엔게젤샤프트
- 申请人地址： Iramali **, LI-**** Balzers, Liechtenstein
- 专利权人： 에바텍 어드벤스드 테크놀로지스 아크티엔게젤샤프트
- 当前专利权人： 에바텍 어드벤스드 테크놀로지스 아크티엔게젤샤프트
- 当前专利权人地址： Iramali **, LI-**** Balzers, Liechtenstein
- 代理人： 김경희
- 优先权： US61/117,353 2008-11-24
- 国际申请： PCT/IB2009/055201 2009-11-20
- 国际公布： WO2010058366 2010-05-27
- 主分类号： H01J37/34
- IPC分类号： H01J37/34
Sputtering apparatus of the present invention includes a vacuum chamber defined by at least one side wall, a bottom and a cover, and at least one first electrode having a surface arranged in a vacuum chamber, and having a surface arranged in a vacuum chamber, a counter electrode, an RF generator. RF generators are configured by applying a RF electric field across the at least one first electrode and the counter electrode to ignite a plasma between the first electrode and the counter electrode. The counter electrode comprises a side wall and / or at least a portion of the additional conductive member of the bottom of the vacuum chamber. The conductive member of the add is generally parallel to and including the at least two surfaces spaced a predetermined distance from each other.
公开/授权文献:
- KR101670101B1 ＲＦ 스퍼터링 장치 公开/授权日：2016-10-27