基本信息:
- 专利标题： 2-치환된 히드록시 이미노-2-(5-아미노-1,2,4-티아 디아졸-3-일) 초산의 제조 방법
- 专利标题（英）：KR940000449A - Substituted 2-hydroxyimino-2- (5-amino-1,2,4-thiadiazol-3-yl) The process for producing acetic acid
- 专利标题（中）：制备2-取代的羟基亚氨基-2-（5-氨基-1,2,4-噻二唑-3-基）
- 申请号：KR1019920010428 申请日：1992-06-16
- 公开(公告)号：KR1019940000449A 公开(公告)日：1994-01-03
- 发明人： 김성겸 , 권태석
- 申请人： 주식회사 엘지
- 申请人地址： ***, Yeoui-daero, Yeongdeungpo-gu, Seoul, (***-***), Republic of Korea
- 专利权人： 주식회사 엘지
- 当前专利权人： 주식회사 엘지
- 当前专利权人地址： ***, Yeoui-daero, Yeongdeungpo-gu, Seoul, (***-***), Republic of Korea
- 主分类号： C07D285/08
- IPC分类号： C07D285/08
1 -Y와 반응시켜 하기일반식(Ⅲ)의 화합물을 합성하고; 나) 상기에서 일반식(Ⅲ)의 화합물을 암모니아 및/또는 암모늄 염과 반응시켜 일반식(Ⅳ)의 화합물을 염의 형태로 전환시킨 후; 다) 이를 알코올 용매중에서 할로겐화제 및 알칼리금속 티오시아네이트와 반응시켜 생성된 일반식(Ⅴ)의 화합물을 분리하지 않고 반응용매만을 공비증류하여 제거한 다음 동일 반응기내에서 곧바로 가수분해하여 일반식(Ⅰ)의 2-치환된 히드록시이미노-2-(5-아미노-1,2,4-티아디아졸-3-일)초산의 제조방법에 관한 것이다.
상기 식에서, R
1 형태로 적당한 치환체로 치환가능한 저급알킬기, 저급알케닐기, 저급 알키닐기, 저급 시클로 알케닐기를 나타내고, Y는 할로겐화수소산(예, 염산, 브롬화수소산) 또는 술폰산(예, 메탄술폰산, p-톨루엔술폰산 등)과 같은 산잔기를 나타낸다.
The present invention relates to a process for preparing the general formula (Ⅰ) 2- substituted hydroxyimino-2- (5-amino-1,2,4-thiadiazol-3-yl) acetate represented by the ) to then formula (ⅱ) a no nitrile sodium nitrite and acid towards the end of the reaction, water and a water-immiscible reacted with R 1 -Y under a base and a phase transfer catalyst in a two-phase solvent of an organic solvent general formula synthesis of the compound of (ⅲ) and; B) it is reacted with ammonia and / or ammonium salt of a compound of formula (Ⅲ) in the By converting a compound represented by the general formula (Ⅳ) in salt form; C) by directly hydrolyzing it in a halogenating agent and an alkali metal thiocyanate and does not react to isolate the compound of formula (Ⅴ) generated removed by azeotropic distillation only reaction solvent, and then the same reactor in an alcohol solvent general formula (Ⅰ ), the hydroxyimino-2- (5-amino-1,2,4-thiadiazol-3-yl) 2-substituted in a method for producing acetic acid. Wherein R, R 1 form a optionally substituted lower alkyl group by suitable substituents, a lower alkenyl group, lower alkynyl group, a lower cycloalkyl represents an alkenyl group, Y is a hydrohalic acid (e.g., hydrochloric acid, hydrobromic acid) or sulfonic acid (e.g., methanesulfonic acid, It represents an acid residue such as p- toluenesulfonic acid, etc.).
信息查询:
EspacenetIPC结构图谱:
| C | 化学；冶金 |
| --C07 | 有机化学 |
| ----C07D | 杂环化合物 |
| ------C07D285/00 | 杂环化合物，有氮原子和硫原子作为仅有的杂环原子的环，不包含在C07D275/00至C07D283/00组中 |
| --------C07D285/01 | .五元环 |
| ----------C07D285/02 | ..噻二唑；氢化噻二唑 |
| ------------C07D285/04 | ...不和其他环稠合 |
| --------------C07D285/08 | ....1,2,4-噻二唑；氢化1,2,4-噻二唑 |