基本信息:
- 专利标题： 포지티브형 감광성 수지 조성물, 광경화성 드라이 필름 및 그 제조 방법, 패턴 형성 방법, 및 적층체
- 专利标题（英）：KR101919226B1 - Positive photosensitive resin composition, photo-curable dry film and method for producing the same, patterning process, and laminate
- 申请号：KR1020170027207 申请日：2017-03-02
- 公开(公告)号：KR101919226B1 公开(公告)日：2018-11-15
- 发明人： 다케무라가츠야 , 이이오마사시 , 우라노히로유키 , 미야자키다카시
- 申请人： 신에쓰 가가꾸 고교 가부시끼가이샤
- 申请人地址： 일본 도꾜도 지요다꾸 오떼마치 *쪼메 *방 *고
- 专利权人： 신에쓰 가가꾸 고교 가부시끼가이샤
- 当前专利权人： 신에쓰 가가꾸 고교 가부시끼가이샤
- 当前专利权人地址： 일본 도꾜도 지요다꾸 오떼마치 *쪼메 *방 *고
- 代理人： 김진회; 김태홍
- 优先权： JPJP-P-2016-042250 2016-03-04
- 主分类号： G03F7/075
- IPC分类号： G03F7/075 ; G03F7/039 ; G03F7/004 ; B32B27/08 ; B32B37/24 ; B32B38/00 ; G03F7/20 ; G03F7/26
The present invention, it is possible to improve the problem of the separation that occurs on the substrate, such as Cu and the metal wiring, such as Al, electrode, substrate, in particular SiN, using a 2.38% TMAH aqueous solution to be used universally in the developing solution, the pattern to provide a bottom, scum and footing the positive photosensitive resin composition capable of forming a fine pattern in the form of a taper in order without producing on a substrate an object.
The above object is, (A) to have a repeating unit represented by the general formula (1), a polymer compound having a siloxane chain having a weight average molecular weight of 3,000~500,000, (B) generating an acid by light and in an alkaline aqueous solution is achieved with the photosensitive material that the dissolution rate increases, (C) a crosslinking agent, and (D) the positive photosensitive resin composition containing a solvent.