基本信息:
- 专利标题: 레티클 포드
- 专利标题(英):Reticle Pod
- 申请号:KR1020137024088 申请日:2006-09-27
- 公开(公告)号:KR101442451B1 公开(公告)日:2014-09-22
- 发明人: 콜보우스티븐피. , 맥뮬렌케빈 , 티벤앤써니엠. , 쿠스즈매튜 , 앤더센크리스챤 , 왕후아핑 , 시제브스키마이클 , 존슨마이클엘. , 핼브마이어데이빗엘. , 리스타드죤
- 申请人: 엔테그리스, 아이엔씨.
- 申请人地址: *** Concord Road, Billerica, Massachusetts *****-****, United States of America
- 专利权人: 엔테그리스, 아이엔씨.
- 当前专利权人: 엔테그리스, 아이엔씨.
- 当前专利权人地址: *** Concord Road, Billerica, Massachusetts *****-****, United States of America
- 代理人: 양영준; 안국찬
- 优先权: US60/720,762 2005-09-27; US60/720,777 2005-09-27; US60/720,778 2005-09-27; US60/774,391 2006-02-18; US60/774,537 2006-02-18
- 国际申请: PCT/US2006/037465 2006-09-27
- 国际公布: WO2007038504 2007-04-05
- 主分类号: H01L21/673
- IPC分类号: H01L21/673 ; B65D85/86 ; B65D85/38 ; G03F1/66
The present invention according, a diffusion barrier for providing to to a wafer or reticle in cooperation with that, for example, inside the housing a wafer or a reticle, and at least in contact with, including the supporting structure, and environment control means for providing that the container is a wafer or a reticle of thereby reducing the particles settle on the surface. The container includes a base having a flat polishing surface and having a protrusion placed a wafer or a reticle. Projections are given a minimum of contact and form of a wafer or reticle by suspending over a base to provide a gap therebetween, and the sphere and the wafer or a reticle. But the gap is isolated from the reticle or wafer flat and polishing the surface of the base, the dimensions are determined so as to suppress the movement of the particles into the gap, to prevent the contamination of the sensitive surface of a wafer or a reticle. The diffusion filter is provided for pressure equalization, without the filter media. It provides a reticle movable reticle restraint pin on the top cover. An example embodiment provides a dual storage pods isolated and protected.
公开/授权文献:
- KR1020130108676A 레티클 포드 公开/授权日:2013-10-04