基本信息:
- 专利标题： 전도체 및 이의 제조방법
- 专利标题（英）：Electric conducting body and method for preparing the same
- 专利标题（中）：导电体及其制备方法
- 申请号：KR1020100069157 申请日：2010-07-16
- 公开(公告)号：KR101144537B1 公开(公告)日：2012-05-11
- 发明人： 이동욱 , 황인석 , 전상기 , 황지영 , 최현 , 홍영준 , 김수진 , 김기환
- 申请人： 주식회사 엘지화학
- 申请人地址： ***, Yeoui-daero, Yeongdeungpo-gu, Seoul, Republic of Korea
- 专利权人： 주식회사 엘지화학
- 当前专利权人： 주식회사 엘지화학
- 当前专利权人地址： ***, Yeoui-daero, Yeongdeungpo-gu, Seoul, Republic of Korea
- 代理人： 정순성
- 优先权： KR1020090065103 2009-07-16; KR1020090065106 2009-07-16
- 主分类号： H05K9/00
- IPC分类号： H05K9/00 ; G02B5/28
The present invention provides a conductor the electrically conductive pattern is provided on at least one side of a transparent substrate, and the transparent substrate, at least 30% of the total area of the transparent substance, when drew a straight line intersecting with the electrically conductive pattern, the straight line and provides a conductor, and a method of manufacturing which is characterized by having the electric ratio of standard deviation in respects to an average value of distances between adjacent intersection points of the conductive pattern (distance distribution ratio) is 2% or more electrically conductive patterns. In addition, the present invention as at least one conductor the electrically conductive patterns provided on one surface of a transparent substrate, and the transparent substrate, the transparent at least 30% of the total area of the base material is made up of, distribution of continuous closed shape, the closed ratio of standard deviation in respects to an average value of the area of the shape (area distribution ratio) provides a conductor, and a method of manufacturing which is characterized by having the electrically conductive pattern is not less than 2%.
公开/授权文献:
- KR1020110007593A 전도체 및 이의 제조방법 公开/授权日：2011-01-24
信息查询:
EspacenetIPC结构图谱:
| H | 电学 |
| --H05 | 其他类目不包含的电技术 |
| ----H05K | 印刷电路；电设备的外壳或结构零部件；电气元件组件的制造 |
| ------H05K9/00 | 设备或元件对电场或磁场的屏蔽 |