基本信息:
- 专利标题： GLASS COMPOSITION FOR PHOTOSENSITIVE GLASS PASTE
- 申请号：JP27361097 申请日：1997-09-19
- 公开(公告)号：JPH1192168A 公开(公告)日：1999-04-06
- 发明人： EGUCHI TOSHIO , TANIGAMI YOSHINORI
- 申请人： NIPPON YAMAMURA GLASS KK
- 专利权人： NIPPON YAMAMURA GLASS KK
- 当前专利权人： NIPPON YAMAMURA GLASS KK
- 优先权： JP27361097 1997-09-19
- 主分类号： C03C3/064
- IPC分类号： C03C3/064 ; C03C3/066 ; C03C4/04 ; C03C8/04
摘要：
PROBLEM TO BE SOLVED: To obtain a glass compsn. capable of preparing a photosensitive glass paste used for forming a high definition pattern such as barrier ribs in a plasma display panel or a plasma address liq. crystal display, not contg. high toxicity lead, capable of high definition working, less liable to gel and having a long pot life. SOLUTION: The glass compsn. has an oxide compsn. contg., by weight, 3-30% SiO2 , 5-25% Al2 O3 , 28-47% B2 O3 , 0-45% ZnO, 1-25% at least one of MgO and CaO, 1-20% at least one of SrO and BaO, (2% -85×10 /K coefft. of thermal expansion and 450-530 deg.C glass transition temp.
公开/授权文献:
- JP3696725B2 Photosensitive glass paste for glass composition 公开/授权日：2005-09-21