基本信息:
- 专利标题: ELECTRON GUN FOR GENERATING LINEAR ELECTRON BEAM
- 申请号:JP23197291 申请日:1991-09-11
- 公开(公告)号:JPH0574394A 公开(公告)日:1993-03-26
- 发明人: SHIBATA KEIICHIRO , ABE MITSUJI
- 申请人: HITACHI LTD
- 专利权人: HITACHI LTD
- 当前专利权人: HITACHI LTD
- 优先权: JP23197291 1991-09-11
- 主分类号: H01J35/02
- IPC分类号: H01J35/02 ; H01J37/06
摘要:
PURPOSE:To provide an electron gun for generating a large current of electron beam with nearly an uniform length. CONSTITUTION:When a negative electrode high voltage pulse is applied to a conductor 11 with conductors 12 as an earth potential, electrons are generated by creeping discharge on the anode opposite surface of an insulator 2, and electron beams are accelerated toward the anode. When the conductors 12 are provided so as to longitudinally disperse the positions to generate creeping discharge, the concentration of electron generating sources can be prevented, and nearly uniform lengthy electron beams can be provided. Capacitors 3 provided between the conductors 12 and a box body at the earth potential generate the creeping discharge independently in all the dispersedly provided creeping discharge generating parts.