发明专利
JP2010002538A Photosensitive composition, pattern forming method using it, and method of manufacturing semiconductor element
有权
基本信息:
- 专利标题： Photosensitive composition, pattern forming method using it, and method of manufacturing semiconductor element
- 专利标题（中）：感光性组合物，使用其的图案形成方法及制造半导体元件的方法
- 申请号：JP2008160023 申请日：2008-06-19
- 公开(公告)号：JP2010002538A 公开(公告)日：2010-01-07
- 发明人： CHOKAI MINORU , ITANI TOSHIRO
- 申请人： Nec Electronics Corp , Necエレクトロニクス株式会社
- 专利权人： Nec Electronics Corp,Necエレクトロニクス株式会社
- 当前专利权人： Nec Electronics Corp,Ｎｅｃエレクトロニクス株式会社
- 优先权： JP2008160023 2008-06-19
- 主分类号： G03F7/004
- IPC分类号： G03F7/004 ; C08F212/14 ; G03F7/039 ; H01L21/027
摘要：
PROBLEM TO BE SOLVED: To form a resist pattern having excellent resolution and sensitivity.
SOLUTION: The photosensitive composition to which a high-energy beam having a wavelength in the band of 1-300 nm is irradiated includes a binder resin, and a photoelectron absorbing agent to be reacted with photoelectrons emitted from the binder resin absorbing the high-energy beam when the high-energy beam is irradiated onto the binder resin.
COPYRIGHT: (C)2010,JPO&INPIT
摘要（中）：
SOLUTION: The photosensitive composition to which a high-energy beam having a wavelength in the band of 1-300 nm is irradiated includes a binder resin, and a photoelectron absorbing agent to be reacted with photoelectrons emitted from the binder resin absorbing the high-energy beam when the high-energy beam is irradiated onto the binder resin.
COPYRIGHT: (C)2010,JPO&INPIT
要解决的问题：形成具有优异的分辨率和灵敏度的抗蚀剂图案。 解决方案：照射波长在1-300nm波长的高能束的感光组合物包括粘合剂树脂和与从吸附了粘合剂树脂的粘合剂树脂发射的光电子反应的光电子吸收剂 高能束照射到粘合剂树脂上时的高能束。 版权所有（C）2010，JPO＆INPIT