PROBLEM TO BE SOLVED: To provide an improved method allowing the fabrication of a nano-structural device having a very small geometric feature. SOLUTION: The nano-structure is formed on a surface of a semiconductor substrate or a surface of a passivated semiconductor substrate by the process comprising a step of forming one or more electrically charged sites having a preliminarily decided shape, where a first surface part corresponding to the one or more sites is brought into contact with a solid material tool (9) so that an electric charge moves between the tool and the first surface; a step of depositing particles (7) of a second material onto the first surface by making the particles (7) to flow near the one or more electrically charged sites to attract or repulse the particles (7) to or from the one or more electrically charged sites so as to conform the particles (7) to the electrically charged sites, provided in the step of forming, by virtue of the polarity of the charge against the potarity of the electrically charged sites; and a step of creating a chain (148) of a nanometer-size filament or particle, an array of filament (158) of carbon nanotubes or a filament or nanorod (168) of a semiconductor material or a magnetic material. COPYRIGHT: (C)2008,JPO&INPIT