基本信息:
- 专利标题: Proton neutralizer and resist composition comprising the neutralizer
- 专利标题(中):包含中性粒细胞的原核中和剂和抗性组合物
- 申请号:JP2003009721 申请日:2003-01-17
- 公开(公告)号:JP2004217867A 公开(公告)日:2004-08-05
- 发明人: KUZUHA NOBORU
- 申请人: Eiweiss Kk , アイバイツ株式会社
- 专利权人: Eiweiss Kk,アイバイツ株式会社
- 当前专利权人: Eiweiss Kk,アイバイツ株式会社
- 优先权: JP2003009721 2003-01-17
- 主分类号: G03F7/004
- IPC分类号: G03F7/004 ; C07C271/12 ; C07C271/24 ; C09K3/00 ; G03F7/038 ; G03F7/039
摘要:
PROBLEM TO BE SOLVED: To provide a proton neutralizer having the following proper reactivity: it efficiently reacts with protons generated by dark reaction, under relatively mild conditions such that at storing a resist material, without inhibiting the reaction of the protons with a base polymer at exposure; and to provide a resist composition comprising the neutralizer. SOLUTION: The proton neutralizer is composed of a compound having at least one group expressed by the formula: -(CH 2 )m-NH-( t BOC) bonding to an adamantyl skeleton, as a first proton neutralizer (in the formula m is an integer of 0-5; and t BOC is a tert-butoxycarbonyl group), or a compound represented by the formula: ( t BOC)-NHOH, as a second proton neutralizer. The resist composition comprises the proton neutralizer. COPYRIGHT: (C)2004,JPO&NCIPI
摘要(中):
要解决的问题:提供具有以下适当反应性的质子中和剂:其在相对温和的条件下与暗反应产生的质子有效反应,使得在存储抗蚀剂材料时,不抑制质子与 基础聚合物暴露; 并提供包含中和剂的抗蚀剂组合物。 解决方案:质子中和剂由具有至少一个由下式表示的基团的化合物组成: - (CH 2 SBB)m-NH-(中间体) 与金刚烷基骨架结合,作为第一质子中和剂(式中,m为0-5的整数,且BOC为叔丁氧基羰基),或由下式表示的化合物: (作为第二质子中和剂)。 抗蚀剂组合物包含质子中和剂。 版权所有(C)2004,JPO&NCIPI