基本信息:
- 专利标题： PHOTOELECTRIC SURFACE AND ITS MANUFACTURE
- 申请号：JP17459398 申请日：1998-06-22
- 公开(公告)号：JP2000011856A 公开(公告)日：2000-01-14
- 发明人： SUGA HIROBUMI , UCHIYAMA SHOICHI , ARAGAKI MINORU , FUTAHASHI TOKUAKI
- 申请人： HAMAMATSU PHOTONICS KK
- 专利权人： HAMAMATSU PHOTONICS KK
- 当前专利权人： HAMAMATSU PHOTONICS KK
- 优先权： JP17459398 1998-06-22
- 主分类号： H01J9/12
- IPC分类号： H01J9/12 ; H01J1/34 ; H01J1/78 ; H01J9/233 ; H01J29/38 ; H01J31/50 ; H01J40/06
摘要：
PROBLEM TO BE SOLVED: To provide a photoelectric surface having sensitivity to the short wavelength component of ultraviolet rays and also provide its manufacturing method. SOLUTION: This manufacturing method carries out epitaxial growth of crystal to a light absorbing layer 12 and a thermal expansion buffer layer 15 formed of group III nitride InxAlyGa1-x-yN (0
公开/授权文献:
- JP3806514B2 Photoelectric surface and a method of manufacturing the same 公开/授权日：2006-08-09
信息查询:
EspacenetIPC结构图谱:
| H | 电学 |
| --H01 | 基本电气元件 |
| ----H01J | 放电管或放电灯 |
| ------H01J9/00 | 专用于制造放电管、放电灯及其部件的设备和方法；从放电管或灯回收材料 |
| --------H01J9/02 | .电极或电极系统的制造 |
| ----------H01J9/12 | ..光电发射阴极的；二次发射阴极的 |